2006
DOI: 10.1016/j.tsf.2005.12.300
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Residual stress development in Pb(Zr,Ti)O3/ZrO2/SiO2 stacks for piezoelectric microactuators

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Cited by 44 publications
(36 citation statements)
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“…As dielectric buffer layer, most of the research groups have used zirconia (ZrO 2 ) barrier layers to grow PZT on oxidized silicon. This is very efficient in preventing lead diffusion, but does not promote texturing of PZT [11,[14][15][16][17][18][19]. We found that evaporated magnesia (MgO) thin films worked well as dielectric buffer layers promoting {1 0 0} growth.…”
Section: P Ementioning
confidence: 99%
“…As dielectric buffer layer, most of the research groups have used zirconia (ZrO 2 ) barrier layers to grow PZT on oxidized silicon. This is very efficient in preventing lead diffusion, but does not promote texturing of PZT [11,[14][15][16][17][18][19]. We found that evaporated magnesia (MgO) thin films worked well as dielectric buffer layers promoting {1 0 0} growth.…”
Section: P Ementioning
confidence: 99%
“…The research activities regarding the residual stress characterization in PZT films and the influence of the stress on the electrical properties rapidly increased in the last few years. Although much work has focused on residual stress in CSD PZT films, 28,29 the understanding of the stress development that leads to residual stress is intermittent, particularly in the transition of the wet films to the crystallization. Further, to identify and design a stress-free device structure, it is important to identify the contribution of all layers to the total stress.…”
Section: Introductionmentioning
confidence: 99%
“…5. Stress relaxation in PZT can be explained by either structural changes or adsorption of moisture into the compound of PZT through the grain boundaries [7].…”
Section: Mathematical Modeling For Experiments Resultsmentioning
confidence: 99%