2016
DOI: 10.1063/1.4943401
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Sidewall depletion in nano-patterned LAO/STO heterostructures

Abstract: We report the fabrication of nanostructures from the quasi-two-dimensional electron gas (q2DEG) formed at the LaAlO3/ SrTiO3 (LAO/STO) interface. The process uses electron beam lithography in combination with reactive ion etching. This technique allows to pattern high-quality structures down to lateral dimensions as small as 100nm while maintaining the conducting properties without inducing conductivity in the STO substrate. Temperature dependent transport properties of patterned Hall bars of various widths sh… Show more

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Cited by 10 publications
(16 citation statements)
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“…Up to now temperature dependent transport in this material system has mainly been investigated in large area structures. In these experiments the resistance typically drops monotonically upon cooling, except for a small Kondo like increase at low temperatures which is observed in some samples 10 13 . During warm-up the resistance follows the same temperature dependence as during cooling down.…”
Section: Introductionmentioning
confidence: 63%
See 1 more Smart Citation
“…Up to now temperature dependent transport in this material system has mainly been investigated in large area structures. In these experiments the resistance typically drops monotonically upon cooling, except for a small Kondo like increase at low temperatures which is observed in some samples 10 13 . During warm-up the resistance follows the same temperature dependence as during cooling down.…”
Section: Introductionmentioning
confidence: 63%
“…In all these cases, a monotonic drop in resistance with decreasing temperature was observed. Only recently an etching process was demonstrated by which the electron gas can be patterned into stable nanostructures while maintaining the interface conductivity and keeping the substrate insulating 13 . With these structures temperature dependent resistance measurements have been carried out which yield a surprising result.…”
Section: Introductionmentioning
confidence: 99%
“…The nonconducting areas are created either by our removing the c-LAO by reactive-ion etching (RIE) [ Fig. 1(a)], as demonstrated by Minhas et al [10], or by our locally preventing the growth of more than three unit cells of c-LAO [11]. The latter can be achieved by use of a patterned amorphous LAO (a-LAO) layer with The second process is almost identical to the method described by Schneider et al [11] and is also related to methods [5,6,12] where patterned amorphous materials different from LAO were used to prevent c-LAO growth.…”
Section: Device Descriptionmentioning
confidence: 99%
“…After development, the LAO is patterned by dry etching down to the STO substrate by the etching process described in Ref. [10]. The a-LAO layer is patterned by a standard PMMA lift-off process.…”
Section: Appendix A: Sample Preparationmentioning
confidence: 99%
“…A conventionally used physical etching method, Ar ion irradiation, induces oxygen vacancies at the SrTiO 3 surface (161) and makes it conducting, frustrating the goal of the patterning to define locally conducting regions. We note that, recently, low-energy Ar irradiation processes have been successfully used to pattern LaAlO 3 -SrTiO 3 interfaces (162)(163)(164). Nonetheless, doing so still requires covering the sides of the conducting channel with an additional layer to prevent shorts between gate and channel.…”
Section: Introductionmentioning
confidence: 99%