The
integration of graphene and other two-dimensional (2D) materials
with existing silicon semiconductor technology is highly desirable.
This is due to the diverse advantages and potential applications brought
about by the consequent miniaturization of the resulting electronic
devices. Nevertheless, such devices that can operate at very high
frequencies for high-speed applications are eminently preferred. In
this work, we demonstrate a vertical graphene base hot-electron transistor
that performs in the radio frequency regime. Our device exhibits a
relatively high current density (∼200 A/cm2), high
common base current gain (α* ∼ 99.2%), and moderate common
emitter current gain (β* ∼ 2.7) at room temperature with
an intrinsic current gain cutoff frequency of around 65 GHz. Furthermore,
cutoff frequency can be tuned from 54 to 65 GHz by varying the collector-base
bias. We anticipate that this proposed transistor design, built by
the integrated 2D material and silicon semiconductor technology, can
be a potential candidate to realize extra fast radio frequency tunneling
hot-carrier electronics.