Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement

Jeong, Seong‐Jun; Kim, Ji Eun; Moon, Hyoung-Seok; Kim, Bong Hoon; Kim, Sumin; Kim, Jin Baek; Kim, Sang Ouk

doi:10.1021/nl9004833

Cited by 146 publications

(123 citation statements)

References 43 publications

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“…Aligning symmetric PS-b-PMMA (lamellae) has proven much more difficult when substrate topography is introduced as the PMMA components tend to wet the SiO x mesa sidewall and trench base interfaces. To this end, researchers have devised elaborate schemes for balancing the interfacial energies by using gold strips evaporated onto PS-r-PMMA brush layers [99] or the actual resist pattern for mesa structures [113]; using the alignment properties of a commensurate asymmetric PS-b-PMMA system to create a chemical pre-pattern for directing the lamellae structure [112] or evaporating amorphous silicon onto a PS-r-PMMA combined with tapered trench designs for local defect density minimisation [114]. Figure 10(b) shows a schematic top down and cross sectional lay-out of the tapered substrate approach used to limit defect formation within the channel.…”

Section: Graphoepitaxymentioning

confidence: 99%

“…Li et al have shown that PS-b-PMMA can be directed into linear arrays of parallel PMMA cylinders or hexagonal packed vertically cylinders by subtle film thickness changes using nano-imprinting on a random copolymer brush [94] Graphoepitaxy is undoubtedly a valuable and effective resolution enhancement technique for creating sub 10 nm nanoscale devices. Although graphoepitaxy is a viable approach to realising nanoscale devices, certain challenges must be overcome for the technique to be accepted for future 'complimentary' lithographic technologies, such as channel width and confinement [26,99,110,112,122], mesa to trench dimension [98,122], effect of trench wall and base chemistry [112][113]123] and importantly inhibit defect formation within both the top-down template pattern and bottom-up polymer self-assembled nanopattern [114].…”

Section: Graphoepitaxymentioning

confidence: 99%

“…Jeong et al have recently shown that symmetric PS-b-PMMA can assemble into well-aligned linear arrays of alternating PS and PMMA using a soft lithography approach [113]. Consequently, the authors used this approach to construct both metallic aluminium (additive) and silicon semiconductor (subtractive) nanowires.…”

Section: Nanowire Arraysmentioning

confidence: 99%

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Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

Farrell

Petkov²,

Morris

et al. 2010

Journal of Colloid and Interface Science

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Self-assembled nanoscale porous architectures, such as mesoporous silica films (MPS), block copolymer films (BCP) and porous anodic aluminas (PAAs), are ideal hosts for templating one dimension (1 D) nano-entities for a wide range of electronic, photonic, magnetic and environmental applications. All three templates offer dimensional scalability and tunability over a wide range, with critical pore sizes for each system well below the 20 nm threshold [1][2][3]. Recently, research has progressed towards controlling the pore direction, orientation and long range order of these nanostructures through so called directed self-assembly (DSA). Significantly, the introduction of a wide range of top-down chemically and physically pre-patterning substrates has facilitated the DSA of nanostructures into functional device arrays. The following review begins with an overview of the fundamental aspects of self-assembly and ordering processes during the formation of PAAs, BCPs and MPS films. Special attention is given to the different ways of directing self-assembly, concentrating on properties such as uni-directional alignment, precision placement and registry of the self-assembled structures to hierarchal or top down architectures. Finally, to distinguish this review from other articles we focus on research where nanostructures have been utilised in part to fabricate arrays of functioning devices below the sub 50 nm threshold, by subtractive transfer and additive methods. Where possible, we attempt to compare and contrast the different templating approaches and highlight the strengths and/or limitations that will be important for their potential integration into downstream processes. ACCEPTED MANUSCRIPT 3 SECTION 1.0: SELF ASSEMBLY AND NANO-ARCHITETCURESThe diversity of self-assembled nanostructures and more importantly, their precise orientation within a thin film (fixed to a substrate) ultimately determines their function and overall application. A large population of research reports to date have focused on identifying these orientations and related periodicities, using x-ray and microscopy tools, as well the development of methods for readily manipulating nanostructures, such as pre-patterning of silicon substrates for the alignment of block copolymers (BCPs) [4] and mesoporous thin films (MTFs) [5] and altering the growth direction of porous anodic alumina (PAA) templates [6]. In this section, a brief synopsis of the mechanisms behind the self-assembly/organisation of each system and highlight nanoscale architectures (and orientations), which are important from a device perspective. Templated mesoporous thin filmsOrdered mesoporous powders were first discovered by researchers at the Mobil Petrochemical Corporation in 1992 and shortly after, sol-gel derived mesoporous silica films were fabricated [1,7].The first series of ordered mesoporous films were reported by Yang et al. in 1996 [8], prepared using initial surfactant concentrations above their critical micelle concentration (CMC). However the films prepared fil...

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Section: Graphoepitaxymentioning

confidence: 99%

Section: Graphoepitaxymentioning

confidence: 99%

See 1 more Smart Citation

Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

Farrell

Petkov²,

Morris

et al. 2010

Journal of Colloid and Interface Science

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show abstract

“…A variety of periodic nanoscale morphologies such as sphere or cylinder array, or lamellae self-assembled in block copolymer thin films enable ultrafine and dense nanopatterning with the characteristic dimension of a 5$50 nm scale. [19][20][21][22][23][24][25][26][27][28] The scalable and parallel assembly of block copolymers enables large-scale nanopatterning with fine tunability over the shape, density, and characteristic dimensions. Despite its enormous advantages, block copolymer lithography has thus far mostly been employed for the fabrication of electronic or magnetic nanostructures.…”

Section: 14mentioning

confidence: 99%

A plasmonic biosensor array by block copolymer lithography

et al. 2010

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Highly uniform and dense, hexagonal noble metal nanoparticle arrays were achieved on large-area transparent glass substrates via scalable, parallel processing of block copolymer lithography. Exploring their localized surface plasmon resonance (LSPR) characteristics revealed that the Ag nanoparticle array displayed a UV-vis absorbance spectrum sufficiently narrow and intense for biosensing application. A highly-sensitive, label-free detection of prostate cancer specific antibody (anti-PSA) with sub-ng ml À1 level detection limit (0.1$1 ng ml À1) has been accomplished with the plasmonic nanostructure. Our approach offers a valuable route to a low-cost, manufacture-scale production of plasmonic nanostructures, potentially useful for various photonic and optoelectronic devices.

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“…The directed self-assembly (DSA) of BCP thin films using chemical [3][4][5][6][7][8] or topographical [9][10][11][12][13][14][15][16] templates to impose long-range order and registration on the BCP domains has garnered increased interest in recent years as a means to enhance lithographic resolution by multiplying the feature density [5][6][7][8][13][14][15] and rectifying pattern non-uniformity or imperfections 5,6,17,18 of lithographically defined templates. Selective removal or alteration of one block then creates a mask that may be combined with other manufacturing techniques to fabricate devices such as patterned magnetic recording media 19 , silicon nanowire transistors 20 or FinFETs 21 .…”

mentioning

confidence: 99%

Enabling complex nanoscale pattern customization using directed self-assembly

et al. 2014

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Block copolymer directed self-assembly is an attractive method to fabricate highly uniform nanoscale features for various technological applications, but the dense periodicity of block copolymer features limits the complexity of the resulting patterns and their potential utility. Therefore, customizability of nanoscale patterns has been a long-standing goal for using directed self-assembly in device fabrication. Here we show that a hybrid organic/inorganic chemical pattern serves as a guiding pattern for self-assembly as well as a self-aligned mask for pattern customization through cotransfer of aligned block copolymer features and an inorganic prepattern. As informed by a phenomenological model, deliberate process engineering is implemented to maintain global alignment of block copolymer features over arbitrarily shaped, 'masking' features incorporated into the chemical patterns. These hybrid chemical patterns with embedded customization information enable deterministic, complex two-dimensional nanoscale pattern customization through directed self-assembly.

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Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement

Cited by 146 publications

References 43 publications

Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

A plasmonic biosensor array by block copolymer lithography

Enabling complex nanoscale pattern customization using directed self-assembly

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