Sputter-assisted plasma CVD of polymer-like amorphous CN :H films using supermagnetron plasma

Kinoshita, Haruhisa; Ikuta, Rikizo; Sakurai, Katsutoshi

doi:10.1016/j.tsf.2006.02.068

Cited by 6 publications

(7 citation statements)

References 17 publications

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“…At LORF of 0 W, it increased with a decrease in UPRF from 800 to 50 W. This increase was caused by the sputter deposits of a counter electrode (from the upper electrode to the lower electrode), i.e., CC sp 2 cluster components decreased slightly with a decrease in UPRF. 14) The optical band gap shown in Fig. 6 (N 2 concentration of 70%) decreased with an increase in N 2 concentration from 25 to 70%, in comparison to the value shown in Fig.…”

Section: Resultsmentioning

confidence: 62%

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Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Kinoshita

Yamaguchi

2010

Jpn. J. Appl. Phys.

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The design, construction and operation of a compact, high-efficiency Bragg diffraction spectrometer are described. An accurate method of alignment is presented. The spectrometer has been tested with a lead stearate analysing crystal by measuring carbon K (methane) and argon L x-ray energies produced by direct electron beam excitation. The high efficiency of this apparatus is demonstrated by measuring satellite lines of the neon K spectrum with a RbAP analysing crystal.

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Section: Resultsmentioning

confidence: 62%

“…16) In contrast, at an LORF of 0 W, the refractive index decreased to 1.45 -1.75, indicating that these films were polymer-like. 14) These films were deposited by sputter deposits (from the upper electrode to the lower electrode) and radicals present during the discharge off-time.…”

Section: Resultsmentioning

confidence: 99%

Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Kinoshita

Yamaguchi

2010

Jpn. J. Appl. Phys.

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“…These films are formed by various deposition methods such as electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD), 2) pulsed filtered vacuum arc deposition, 3) magnetron sputtering, 4) plasma CVD, 5) and supermagnetron plasma CVD. 6) Because of these many deposition methods, the formed polymer-like amorphous carbon films have various properties. It is rather difficult to form films with similar properties using different deposition methods.…”

Section: Introductionmentioning

confidence: 99%

“…It is rather difficult to form films with similar properties using different deposition methods. Polymer-like hydrogenated amorphous carbon nitride (a-CN x :H) deposited by supermagnetron plasma CVD was investigated by Kinoshita et al 6) Using supermagnetron plasma CVD, photoluminescences (PLs) with various peak energies were observed in the deposited a-CN x :H films. The peak energy was decreased by increasing the upper electrode rf power (UPRF) of the supermagnetron plasma apparatus.…”

Section: Introductionmentioning

confidence: 99%

Luminescence Properties of Amorphous Carbon Films Formed Using Supermagnetron Plasma

Sakurai

Kinoshita

Ohno

et al. 2008

jjap

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A study has been made of the interfaces of sintered Ag-(100) InP metalsemiconductor contacts. The experimental conditions associated with the fabrication of the contacts have been identical to those used in the manufacture of the silver cathodes that are utilised in indium phosphide microwave oscillators. The examination has been performed with a systematic Auger profiling of a number of junctions. The Auger profiles have been complemented by direct examination of the contact's interface with scanning electron and optical microscopy. Following the sintering procedure considerable cross-diffusion of the constituent elements forming the contact has been seen to occur. The resulting Auger profile is shown to be a consequence of the formation of a solid solution of indium in silver, recrystallisation occurring within the silver metal, and the development of a silver phosphide compound within the silver metal close to the interface.

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“…a-CN x :H CVD (N 2 : 70% and N 2 /H 2 : 0/50%) and a-C:H SD (Ar) films were deposited using a supermagnetron plasma deposition apparatus. 7) The experimental arrangement is shown in Fig. 1.…”

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confidence: 99%

Oxidation of Amorphous Carbon Films by Ultraviolet Light Irradiation and Thermal Annealing

Kinoshita¹,

Sakurai²

2008

jjap

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Using polymer-like amorphous carbon films deposited using supermagnetron plasma, ultraviolet light irradiation and thermal annealing effects in air were studied. Upper and lower electrode rf powers (UPRF/LORF) were selected to be 5/5 W, and such films were deposited using i-C 4 H 10 , and N 2 or H 2 plasma chemical vapor deposition (CVD). For comparison, polymer-like amorphous carbon films were deposited using Ar magnetron sputtering. By X-ray fluorescence spectroscopy (XFS), an increase in oxygen atom concentration and a small change in nitrogen atom concentration were observed under both ultraviolet (UV) light exposure and thermal annealing.

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Sputter-assisted plasma CVD of polymer-like amorphous CN :H films using supermagnetron plasma

Cited by 6 publications

References 17 publications

Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Luminescence Properties of Amorphous Carbon Films Formed Using Supermagnetron Plasma

Oxidation of Amorphous Carbon Films by Ultraviolet Light Irradiation and Thermal Annealing

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