Step and flash nanoimprint lithography in Europe

Abstract

anoimprint ithography is a technology which has been developed during the last decade for achieving stmctnres in the nanometer range. The authon show a short overview of the mainstream processes and work out the advantages of the tep and Flash Imprint ithography -FI . rocess results reached at olecular Imprint Inc.11, ustin, Te as, confirm this theses. comparison is done hetween optical lithography and the dillerent imprint techniques. ereby -FI is the most amactive technology enabling low cost lithography m the nanometer range. Inder Termsan0 imprint lithography, -FI , mulB layer processing, ne t generation lithography

Design and kinematics analysis of a 3-DOF precision positioning stage

“…Thus, (4) and (5) can be derived. cosBij =CO~~jO +~~J= cosBijo-~Bij sin~jo (4) sin Bij =sin(Bijo+~Bij)= sin Bijo+~Bij cos Bijo (5) As illustrated in Fig. 3, the link B;CiDiE i is thought as rigid bodies, therefore Oip=O;3=Oi5,~OiZ=~Oi6=~OiP and sinOi4o=0.…”

Stiffness analysis of a compliant precision positioning stage

“…[1][2][3][4] Recently, many experts have paid more attention to the micro/nano-positioning system for NIL. It is recognized as the next generation lithography.…”

“…It is recognized as the next generation lithography. [1][2][3][4] Recently, many experts have paid more attention to the micro/nano-positioning system for NIL. Choi et al 5 developed a 3-degree of freedom (DOF) orientation stage for high-resolution step and flash imprint lithography, which utilized a ring that comprises three fixed beams.…”