2015
DOI: 10.1021/nl504241g
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Strain and Stability of Ultrathin Ge Layers in Si/Ge/Si Axial Heterojunction Nanowires

Abstract: The formation of abrupt Si/Ge heterointerfaces in nanowires presents useful possibilities for bandgap engineering. We grow Si nanowires containing thick Ge layers and sub-1 nm thick Ge "quantum wells" and measure the interfacial strain fields using geometric phase analysis. Narrow Ge layers show radial compressive strains of several percent, while stress at the Si/Ge interface causes lattice rotation. High strains can be achieved in these heterostructures, but we show that they are unstable to interdiffusion.

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Cited by 28 publications
(24 citation statements)
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“…The results obtained in this work for 0001 -oriented (In,Ga)N/GaN NWs are also valid for other axial semiconductor NW heterostructures, including all 0001 -oriented wurtzite NWs, but also 111 -oriented NWs composed of diamond and zincblende materials such as Ge/Si [33][34][35], Si/GaP [36], InAs/InP [37,38], CdTe/ZnTe [39]. For all these materials systems, the strain anomaly investigated in the present work is not only of academic interest, but has potentially far-reaching consequences for their application in electronic and optoelectronic devices.…”
supporting
confidence: 69%
“…The results obtained in this work for 0001 -oriented (In,Ga)N/GaN NWs are also valid for other axial semiconductor NW heterostructures, including all 0001 -oriented wurtzite NWs, but also 111 -oriented NWs composed of diamond and zincblende materials such as Ge/Si [33][34][35], Si/GaP [36], InAs/InP [37,38], CdTe/ZnTe [39]. For all these materials systems, the strain anomaly investigated in the present work is not only of academic interest, but has potentially far-reaching consequences for their application in electronic and optoelectronic devices.…”
supporting
confidence: 69%
“…4 Using a modified growth procedure, interfaces with a high compressive stress were also achieved. 5 High and localized strains also exist in various mismatched heterostructures, thanks to the same interfacial configuration as here ([InAs/GaSb] 6 and [ZnTe/CdSe] 7 ) or to a nanowire geometry [8][9][10] for instance. In this article, the elastic properties of [InAs/AlSb] heterostructures are theoretically investigated with a special emphasis on the perfect interfaces of AlAs-or InSb-type.…”
mentioning
confidence: 67%
“…The interdiffusion can be because of high strains and concentration gradient. 26,31 The effect of RTA, for instance is clearly observed on the evolution of strain as a function of annealing time and temperature. For increasing annealing temperature and dwell time, signicant strain relaxation was attained in the Si-Ge layer.…”
Section: Resultsmentioning
confidence: 99%