2015
DOI: 10.1149/2.0051507jss
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Structural, Electrical, and Optical Properties of Photochemical Metal-Organic-Deposited ZnO Thin Films Incorporated with Ag Nanoparticles and Graphene

Abstract: Ag nanoparticles (NPs) and/or graphene were incorporated into a zinc oxide (ZnO) photosensitive precursor solution. Then, directpatternable ZnO nanocomposite thin films were fabricated via photochemical metal-organic deposition. The transmittance and crystallinity of ZnO films were not almost changed but the resistivity of ZnO thin films was decreased by after incorporation of Ag NPs and/or graphene. Especially a double incorporation (Ag NPs and graphene) led to a greater decrease in the resistivity of the fil… Show more

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Cited by 6 publications
(1 citation statement)
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References 23 publications
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“…The PMOD based lithography techniques have also been used to deposit films of metal oxides containing nanoparticles (e.g., CdS, Ag, Pt, and Fe 2 O 3 ). [46,[60][61][62] In contrast to other lithographic techniques and additive printing methods for material patterning, the PMOD based approaches have potential advantages that include processing under ambient conditions and fewer steps required to deposit and pattern metal or metal oxide films. [63] In this paper, we report the preparation of films of titanium oxide (TiO x ) with well-defined, high-resolution patterns and with UCNPs embedded within these films.…”
mentioning
confidence: 99%
“…The PMOD based lithography techniques have also been used to deposit films of metal oxides containing nanoparticles (e.g., CdS, Ag, Pt, and Fe 2 O 3 ). [46,[60][61][62] In contrast to other lithographic techniques and additive printing methods for material patterning, the PMOD based approaches have potential advantages that include processing under ambient conditions and fewer steps required to deposit and pattern metal or metal oxide films. [63] In this paper, we report the preparation of films of titanium oxide (TiO x ) with well-defined, high-resolution patterns and with UCNPs embedded within these films.…”
mentioning
confidence: 99%