“…The distinguishable performance of ICP compared to other plasma generation techniques have been widely required during the production of high purity materials, thin deposition [ 6 , 7 ], surface modification [ 8 , 9 ] and waste treatment [ 10 , 11 , 12 ], and chemical synthesis and chemical processing [ 13 , 14 , 15 ]. For material processing in particular, ICP thermal plasma covers numerous applications such as spectrochemical analysis, powder spheroidization, etching, surface treatment, sintering, spray coating, and material synthesis including nanoparticles, composites, and catalysts [ 16 , 17 , 18 , 19 ].…”