Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Amako, Jun; Sawaki, Daisuke

doi:10.1364/ao.51.003526

Cited by 9 publications

(3 citation statements)

References 22 publications

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“…Static NFH setup Fig. 2 shows a conventional NFH setup denoted as the static NFH (SNFH) (Amako & Sawaki, 2012;Li et al, 2016). The unstructured surface of the phase mask faces the photoresist layer on a fused silica grating substrate (refractive index n = 1.482-325 nm).…”

Section: Specifications Of a Soft X-ray Vlsgmentioning

confidence: 99%

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

et al. 2019

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A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm−1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL–NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

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Section: Specifications Of a Soft X-ray Vlsgmentioning

confidence: 99%

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

et al. 2019

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“…The half pitch resolution of conventional interference lithography, however, is theoretically limited by one quarter of light wavelength. For the improvement of resolution, light sources with shorter wavelength have been demonstrated, such as deep ultraviolet (DUV) 5 , extreme ultraviolet (EUV) 6 7 , and soft X-ray 8 . Unfortunately, the expensive laser setups and complex processing impede their practical applications.…”

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confidence: 99%

Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes

Liu

Luo

Zhao

et al. 2016

Sci Rep

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In this paper, large area and deep sub-wavelength interference patterns are realized experimentally by using odd surface plasmon modes in the metal/insulator/metal structure. Theoretical investigation shows that the odd modes possesses much higher transversal wave vector and great inhibition of tangential electric field components, facilitating surface plasmon interference fringes with high resolution and contrast in the measure of electric field intensity. Interference resist patterns with 45 nm (∼λ/8) half-pitch, 50 nm depth, and area size up to 20 mm × 20 mm were obtained by using 20 nm Al/50 nm photo resist/50 nm Al films with greatly reduced surface roughness and 180 nm pitch exciting grating fabricated with conventional laser interference lithography. Much deeper resolution down to 19.5 nm is also feasible by decreasing the thickness of PR. Considering that no requirement of expensive EBL or FIB tools are employed, it provides a cost-effective way for large area and nano-scale fabrication.

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“…Hence, suppressing interface reflections is a promising approach to improving the quality of resist patterns. Recently, Amako et al [18] have successfully reduced interface reflections by filling the gap between the mask and the resist with a refractive index liquid. However, refractive index liquids need time to become uniform and they risk contamination, which renders NFH complicated.…”

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confidence: 99%

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Chen

Kroker

et al. 2016

中国光学快报

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Near-field holography (NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization of soft x-ray diffraction gratings. We show that NFH with reflections reduced by the integration of antireflective coatings (ARCs) simplifies the NFH process relative to that of setups using refractive index liquids. Based on the proposed NFH with ARCs, gold-coated laminar gratings were fabricated using NFH and subsequent ion beam etching. The efficiency angular spectrum shows that the stray light of the gratings is reduced one level of magnitude by the suppression of interface reflections during NFH.

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Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Cited by 9 publications

References 22 publications

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

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