Surface etching effects of amorphous C:H and CN :H films formed by supermagnetron plasma for field emission use

Kinoshita, Haruhisa; Yamashita, Manabu; Yamaguchi, Tomuo

doi:10.1016/j.tsf.2007.08.041

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Cited by 4 publications

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“…These values were sufficiently higher than that of vitreous silica (SiO 2 ), which was 22 GPa, and significantly higher than those of continuous discharge plasma CVD films (below 28 GPa). 21) This high hardness was obtained by continuous radical deposition and periodic ion bombardment over the films as well as because of a stable, low substrate temperature.…”

Section: Resultsmentioning

confidence: 99%

Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Kinoshita

Yamaguchi

2010

Jpn. J. Appl. Phys.

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The design, construction and operation of a compact, high-efficiency Bragg diffraction spectrometer are described. An accurate method of alignment is presented. The spectrometer has been tested with a lead stearate analysing crystal by measuring carbon K (methane) and argon L x-ray energies produced by direct electron beam excitation. The high efficiency of this apparatus is demonstrated by measuring satellite lines of the neon K spectrum with a RbAP analysing crystal.

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Section: Resultsmentioning

confidence: 99%