Among the many available real-time characterization methods,
ellipsometry
stands out with the combination of high sensitivity and high speed
as well as nondestructive, spectroscopic, and complex modeling capabilities.
The thicknesses of thin films such as the complex dielectric function
can be determined simultaneously with precisions down to sub-nanometer
and 10–4, respectively. Consequently, the first
applications of high- and low-temperature real-time ellipsometry have
been related to the monitoring of layer growth and the determination
of optical properties of metals, semiconductors, and superconductors,
dating back to the late 1960s. Ellipsometry has been ever since a
steady alternative of nonpolarimetric spectroscopies in applications
where quantitative information (e.g., thickness, crystallinity, porosity,
band gap, absorption) is to be determined in complex layered structures.
In this article the main applications and fields of research are reviewed.