2015
DOI: 10.1016/j.matlet.2014.10.156
|View full text |Cite
|
Sign up to set email alerts
|

Synthesis of p-type phosphorus doped ZnSe nanowires and their applications in nanodevices

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
12
0

Year Published

2016
2016
2023
2023

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 17 publications
(12 citation statements)
references
References 18 publications
0
12
0
Order By: Relevance
“…p‐Type doping is an efficient approach to tune the electrical properties of these two semiconductors. Similarly to ZnO, group V and group I elements are excellent candidates for ZnSe as p‐type dopants . While for AlN, magnesium (Mg), a typical group II element, has been used to prepare p‐type AlN with satisfying properties.…”
Section: Common P‐type Semiconductor Materialsmentioning
confidence: 99%
“…p‐Type doping is an efficient approach to tune the electrical properties of these two semiconductors. Similarly to ZnO, group V and group I elements are excellent candidates for ZnSe as p‐type dopants . While for AlN, magnesium (Mg), a typical group II element, has been used to prepare p‐type AlN with satisfying properties.…”
Section: Common P‐type Semiconductor Materialsmentioning
confidence: 99%
“…Pöykkoö has shown that doubly charged cation vacancies, , are favored in undoped, n-type ZnSe. Furthermore, the resistivity of ZnSe nanowire-based devices has been observed to range between tens of m m ,, to over 1000 m. , This wide discrepancy is attributed to the presence of point defects that compensate and scatter carriers and to the position of the Fermi level, which determines the fraction of ionized defects implicated in transport.…”
mentioning
confidence: 99%
“…15 Poÿkkoö1 6 has shown that doubly charged cation vacancies, −− V Zn , are favored in undoped, n-type ZnSe. Furthermore, the resistivity of ZnSe nanowirebased devices has been observed to range between tens of mΩ•m 12,17,18 to over 1000 Ω•m. 19,20 This wide discrepancy is attributed to the presence of point defects that compensate 21 and scatter 22 Even in high-purity growth conditions, native defects arising from stoichiometric deviations exist, which can be observed by studying the low-temperature photoluminescence (PL) spectrum.…”
mentioning
confidence: 99%
“…In addition, unlike ZnO, ZnSe is also reported as a p-and n-type semiconductor, although it is still more difficult to realize an effective p-type than n-type ZnSe semiconductor. 12 Till date, various ZnSe nanostructures have been investigated, 13−16 and many different methods have also been reported to prepare ZnSe films, such as chemical bath deposition, 17 magnetron sputtering, 18 coprecipitation method, 19 molecular beam epitaxy, 20 thermal evaporation, 21 electrodeposition, 22 pulsed laser deposition technique, 23 and electron-beam evaporation. 24 Among these preparation methods, electron-beam evaporation has the advantages of economy of materials, convenient operation, and environmental friendliness.…”
Section: Introductionmentioning
confidence: 99%