Synthesis Ti–Si–N nanocomposite coating prepared by a hybrid system of double bending filtered vacuum arc source and magnetron sputtering

Kim, Do-Geun; Svadkovski, Igor; Lee, Seunghun; Choi, Jong-Won; Kim, Jong‐Kuk

doi:10.1016/j.cap.2009.01.027

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Cited by 9 publications

(2 citation statements)

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“…X-ray diffraction (XRD) is used to investigate the crystalline phases of the Ti-Si-C-N coating. [14,[48][49][50][51][52]. These positions of the three peaks are coinciding with the values obtained in the JCPDS card [53].…”

Section: Microstructure Analysissupporting

confidence: 86%

Synthesis and Characterization of Ti-Si-C-N Nanocomposite Coatings Prepared by a Filtered Vacuum Arc with Organosilane Precursors

Lee¹,

Bharathy²,

Elangovan³

et al. 2012

Nanocomposites - New Trends and Developments

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Section: Microstructure Analysissupporting

confidence: 86%

Synthesis and Characterization of Ti-Si-C-N Nanocomposite Coatings Prepared by a Filtered Vacuum Arc with Organosilane Precursors

Lee¹,

Bharathy²,

Elangovan³

et al. 2012

Nanocomposites - New Trends and Developments

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“…5 Ti-Si-N nanocomposite film is one of the promising hard materials, which has been studied extensively in recent years due to its high hardness, 6 low wear coefficient 7 and high chemical stability. 8 Already, Ti-Si-N films have been prepared on high speed steel, 9,10 stainless steel, [11][12][13] cemented carbides, 14,15 silicon 11 and other hard substrates. However, there are few reports of their preparation on soft substrates.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Ti–Si–N films on Al substrates by magnetron sputtering

Pang

Bai

et al. 2013

Surface Engineering

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The objective of this work is to settle the problem of adhesion between hard films and soft metal substrates. Hard Ti-Si-N films were deposited onto soft Al substrates with a double target magnetron sputtering system. The composition, structure, surface morphologies and mechanical properties were characterised by electron probe microanalyser, X-ray diffraction, atomic force microscope, scratch test and nanoindentation respectively. The as-deposited films had good adhesion to the Al substrates and had a smooth and lustrous surface. The maximum hardness of the films achieved was as high as 27?2 GPa at the Si target power of 80 W.

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Ti-Si-N films prepared by magnetron sputtering

Bai

Zhang

et al. 2012

Rare Metals

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Synthesis Ti–Si–N nanocomposite coating prepared by a hybrid system of double bending filtered vacuum arc source and magnetron sputtering

Cited by 9 publications

References 14 publications

Synthesis and Characterization of Ti-Si-C-N Nanocomposite Coatings Prepared by a Filtered Vacuum Arc with Organosilane Precursors

Synthesis and Characterization of Ti-Si-C-N Nanocomposite Coatings Prepared by a Filtered Vacuum Arc with Organosilane Precursors

Deposition of Ti–Si–N films on Al substrates by magnetron sputtering

Ti-Si-N films prepared by magnetron sputtering

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