The Device-Technological Simulation of The Field-Emission Micro-Cathodes Based on Three-Dimensional Soi-Structures

Abstract

The two methods of the formation of the silicon-on-insulator (SOI) local structures have been proposed. The first one is based on the stimulated lateral epitaxial growth and planarization of Si monocrystal film. The second one is based on local thermal oxidation of Si buried layer through horizontal tunnels. The obtained SOIstructures are used in a base matrix crystal fabrication technology for the construction of micro-systems. It is proposed to add to elements of a base crystal of a matrix of cells of field emission micro-cathodes with control circuits. The fabrication technology and the layout of a field emission micro-cathode cell with control high-voltage SOI MOS-transistor has been developed. The computer simulation of high-voltage SOI MOS-transistor static characteristics has been performed.

Higly sensitive active medium of sensor NO2 , based on cholesteric nematic mixture with impurities of carbon nanotubes

“…Sensors with resistive type and optical sensors are used to detect NO2. Semiconductor thin films of organic and inorganic materials [5][6][7] are used as gas sensitive element of sensors with resistive type. The drawbacks of most common resistive methods are the relatively low sensitivity and selectivity, high energy consumption and the need of heating the active environment.…”

Micro- and Nanotextured Silicon for Antireflective Coatings of Solar Cells

“…Furthermore, the reduction of optical losses in multicrystalline silicon solar cells by texturing their surface is one of the most actual issues of modern silicon photovoltaics [19][20][21]. Anisotropic chemical etching, which is widely used for single crystal silicon [22], is inefficient when it is used for non-crystalline or recrystalized modifications of Si [23]. However, more efficient methods of mechanical structuring of silicon surface affect the prime cost of solar cells.…”