1984
DOI: 10.1016/0167-577x(84)90023-5
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The effect of oxygen partial pressure on the properties of RF-sputtered Al2O3 thin films

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Cited by 12 publications
(2 citation statements)
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“…The Zr 3d and Y 3d core level photoelectron peaks for the YSZ film do not appear affected by the oxygen deficiencies. Such oxygen deficiencies are common for oxide materials sputtered in a pure Ar environment [67][68][69][70]. Other GM studies have not typically reported the insulator quality, but similar oxygen vacancies are anticipated throughout the literature.…”
Section: Xpssupporting
confidence: 55%
See 1 more Smart Citation
“…The Zr 3d and Y 3d core level photoelectron peaks for the YSZ film do not appear affected by the oxygen deficiencies. Such oxygen deficiencies are common for oxide materials sputtered in a pure Ar environment [67][68][69][70]. Other GM studies have not typically reported the insulator quality, but similar oxygen vacancies are anticipated throughout the literature.…”
Section: Xpssupporting
confidence: 55%
“…Although the YSZ films are highlyresistive (σ GM ∼ 10 7 σ YSZ ), additional conduction pathways may exist as YSZ is an ionic conductor [94] and the sputtered YSZ films are oxygen deficient. Such oxygen vacancies are common for sputtered oxide materials [67][68][69][70], and it is unclear if oxygen vacancies are more prevalent in the present study compared to the literature. However, the defect states in ZrO 2 might be more energetically accessible for trapassisted tunneling [95], which may partially explain the high conductivities at low metal fractions.…”
Section: Island Morphology and Electron Tunnelingmentioning
confidence: 72%