2018
DOI: 10.1186/s11671-018-2602-6
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The Fabrication of Large-Area, Uniform Graphene Nanomeshes for High-Speed, Room-Temperature Direct Terahertz Detection

Abstract: In recent years, graphene nanomesh (GNM), a material with high flexibility and tunable electronic properties, has attracted considerable attention from researchers due to its wide applications in the fields of nanoscience and nanotechnology. Herein, we have processed large-area, uniform arrays of rectangular graphene nanomesh (r-GNM) and circular graphene nanomesh (c-GNM) with different neck widths by electron beam lithography (EBL). The electronic properties of those high-quality GNM samples have been charact… Show more

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Cited by 19 publications
(8 citation statements)
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References 38 publications
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“…That said, recent developments in the¯eld have allowed for fabrication of large-area continuous and uniform graphene monolayers. 40,41 For example, graphene monolayers of $ 3:5 Â 1:5 cm 2 have been achieved. 40 Lastly, but not the least, the following dielectric material parameters will be considered in fabrication: for the silicon-air con¯guration in near-infrared as shown in Figs.…”
Section: Resultsmentioning
confidence: 99%
“…That said, recent developments in the¯eld have allowed for fabrication of large-area continuous and uniform graphene monolayers. 40,41 For example, graphene monolayers of $ 3:5 Â 1:5 cm 2 have been achieved. 40 Lastly, but not the least, the following dielectric material parameters will be considered in fabrication: for the silicon-air con¯guration in near-infrared as shown in Figs.…”
Section: Resultsmentioning
confidence: 99%
“…At last, a graphene nanomesh structure was fabricated by oxygen plasma etching. The layout of the graphene channel between the source and drain electrodes is shown in Figure 6a, which was processed by EBL [17]. The exploration of the graphene nanomesh is shown in the right image of Figure 6b.…”
Section: Fabrication Of Graphene Nanomesh By Ebl and Opementioning
confidence: 99%
“…Owing to their superior large periphery (compared to basal/planar structure), graphene mesh (GM) architectures, comprising of interconnected graphene wires, are believed as potent edge-rich graphene electrodes for advanced EC applications. Several methods have been employed to fabricate GM, including electron beam lithography [ 22 ], nanoimprint lithography [ 23 ], nanosphere-assisted lithography [ 24 , 25 ], template-assisted lithography [ 26 , 27 ], and self-organized growth [ 28 ]. However, most of these methods require complex lithography and etching (such as reactive ion etching or toxic etching solution) processes, which are costly and hard to scale up.…”
Section: Introductionmentioning
confidence: 99%