The morphology and texture of Cu nanorod films grown by controlling the directional flux in physical vapor deposition

Hf, Li; Kar, Asaranti; Parker, Thomas C.; Gc, Wang; Tm, Lu

doi:10.1088/0957-4484/19/33/335708

Cited by 24 publications

(17 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The plotted data is limited to low temperature, Յ 0.23 so that the island growth can be assumed to be 2D, 23 and ͗s͘ can be directly determined from the experimental using Eq. ͑11a͒, and using an approximate material independent attempt frequency =10 12 Hz, 34,37-39 a constant deposition flux F =2 ML/ s from the experiments, and a homologous activation energy for surface diffusion E m / kT m = 2.46 from Ref. 23.…”

Section: Resultsmentioning

confidence: 99%

“…͑7͒ must only be valid up to a limited height ϳ3 ϫ 10 3 nm, since negative values would lead to a converging morphology at finite temperatures, which seems nonphysical. However, such large h values are not experimentally achievable, as the rods branch due to roughening of the growth front well below the limit of 3 m. 12,28 Figure 5 is a plot of the experimentally determined p as a function of for the temperature range 0.09Յ Յ 0.56. At even higher temperatures, p cannot be determined since the large surface diffusion length scale at Ͼ 0.56 results in the formation of continuous layers, that is, their microstructures exhibit no distinct nanorods for which a width could be measured.…”

Section: -4mentioning

confidence: 99%

“…6,10 A further increase in the diffusion length scale with increasing substrate temperature T s → ϱ causes a decrease in the exponent to p = 0 resulting in a planar surface. 11 Experimental parameters like substrate rotation, [12][13][14] deposition angle, [15][16][17][18] and substrate patterning 5,13,19 also affect p through changes in branching 20 and merging 21 that affect the inter-rod shadowing competition. However, the primary parameter that controls p is T s , which affects GLAD nanostructure broadening and size distribution.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Power law scaling during physical vapor deposition under extreme shadowing conditions

Mukherjee

Gall

2010

Journal of Applied Physics

View full text Add to dashboard Cite

A qualitative model that relates the period of the surface roughness to the vertical and spherical growth rates of glancing angle deposited ͑GLAD͒ nanorods suggests that rod self-shadowing is responsible for the previously reported temperature dependence in the rod width. Atomic shadowing interactions between neighboring rods as well as surface islands on the rod growth fronts control the morphological evolution which is quantified by the growth exponent p that relates the rod width w ͑=Ah p ͒ to their height h. An analytical formalism predicts linear dependences of p and A on the average island separation and provides an explanation for reported anomalous p values. Experimental validation using new and previously published GLAD data for Al, Cr, Nb, and Ta shows quantitative agreement for all metallic systems under consideration and confirms the predicted dependences. In addition, a discontinuity in the p versus homologous deposition temperature suggests a critical value c = 0.24Ϯ 0.02 for a transition from two-dimensional to three-dimensional island growth, which is independently confirmed by a discontinuity in the measured island width.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: -4mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Power law scaling during physical vapor deposition under extreme shadowing conditions

Mukherjee

Gall

2010

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…Two of such techniques are proposed and implemented during the last few years namely oblique angle deposition (OAD) (vapor incident angle less than 85°) of thin films and glancing angle deposition (GLAD) (vapor incident angle greater than 85°) as physical vapor deposition methods have provided facilities for production of variety of nano-structures with structural anisotropy which can be controlled by predesign of the structure [1]. Once these techniques are combined with rotation of substrate in two different directions, two-dimensional and three-dimensional structures can be fabricated [2,3] which is known as thin film nano-engineering. The main phenomenon in oblique angle is the shadowing effect.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of graded helical square tower-like Mn sculptured thin films and investigation of their electrical properties: comparison with perturbation theory

Fakharpour

Savaloni

2017

J Theor Appl Phys

View full text Add to dashboard Cite

Mn sculptured thin films were fabricated in form of graded helical square tower-like terraced sculptured Mn thin films (GHSTTS) using oblique angle deposition together with rotation of substrate about its surface normal with fixed rotation angle (90°) and a shadowing block which was fixed at the centre of the substrate holder. The anisotropy of the samples was examined by resistivity measurements at two orthogonal angles. Direct relationship is obtained between resistivity and the anisotropy of the produced samples which showed that both of these parameters increase with decreasing distance from the edge of the shadowing block. Simulation work using the perturbation theory produced results consistent with the experimental observations.

show abstract

“…Oblique angle deposition has been used exclusively for the fabrication of slanted Cu nanorods. 5,11,12 The oblique angle deposition technique is based on deposition at oblique anlges, where the trajectories of the incident vapor fluxes are directed off-normal (oblique) to the substrate. [13][14][15] Self-shadowing occurs in the initial nucleation stage, preventing film growth in these regions.…”

mentioning

confidence: 99%

Fabrication of Uniformly Arrayed Single- and Multi-Directional Slanted Cu Nanorods

Cho

Kim

Bak

et al. 2015

ECS Solid State Letters

View full text Add to dashboard Cite

Uniformly arrayed single-and multi-directional slanted Cu nanorods on a Si substrate were fabricated using a template of slanted channel structures. The single-directional slanted Cu nanorods were obtained using slanted channel structures oriented at an angle of 15 • with respect to the surface normal. Double-and quadruple-directional slanted Cu nanorods were obtained using double-and quadruple-directional slanted channel structures, respectively. The double-directional Cu nanorods were symmetrically slanted at 30 • , preserving the architecture of the slanted channel structures. The quadruple-directional slanted Cu nanorods had pyramidal structures, with slanted rods positioned at 30 • from the surface normal to the right, left, front, and back. and photocatalysts. Template-based electrochemical deposition is generally employed for the growth of Cu nanorods. Anodic aluminum oxide (AAO) templates have been widely used for fabricating Cu nanorods because the material typically possesses a relatively uniform pore distribution. 2,3,8,9,10 With the templating method, the diameter and periodicity of the Cu nanorods can be precisely controlled by adjusting the characteristics of pores in the templates. The method is relatively simple and inexpensive; however, the angles of the Cu nanorods are limited by the use of vertical structures, which are perpendicular to the substrate surface.Slanted Cu nanorods have been used in heat-transfer devices, 5,6 and have potential applications in the above-mentioned fields. Oblique angle deposition has been used exclusively for the fabrication of slanted Cu nanorods. 5,11,12 The oblique angle deposition technique is based on deposition at oblique anlges, where the trajectories of the incident vapor fluxes are directed off-normal (oblique) to the substrate. [13][14][15] Self-shadowing occurs in the initial nucleation stage, preventing film growth in these regions. The resulting film is inclined in the direction of the vapor source. By rotating the substrate properly, the angle and shape of the structures can be controlled. In oblique angle deposition, the control of the process parameters is relatively simple and various metallic sources can be used. However, extremely precise control over the surface angle is required and the deposited films are usually porous. Controlling the periodicity of the columnar structures in a large area is also difficult, because the columns easily aggregate with each other during deposition.6,11 Şeşen et al. reported that slanted Cu nanorods fabricated by oblique angle deposition were disadvantageous for heat-transfer devices because the denser Cu nanorods, which formed film-like rod structures, acted as thermal resistors.6 Therefore, it is important to control the periodicity and angle of slanted Cu nanorods for use in the above-mentioned applications.Recently, a slanted plasma etching technique for the fabrication of single-and multi-directional slanted channel structures was reported. 16 Because slanted plasma etching can be performed under practical p...

show abstract

The morphology and texture of Cu nanorod films grown by controlling the directional flux in physical vapor deposition

Cited by 24 publications

References 24 publications

Power law scaling during physical vapor deposition under extreme shadowing conditions

Power law scaling during physical vapor deposition under extreme shadowing conditions

Fabrication of graded helical square tower-like Mn sculptured thin films and investigation of their electrical properties: comparison with perturbation theory

Fabrication of Uniformly Arrayed Single- and Multi-Directional Slanted Cu Nanorods

Contact Info

Product

Resources

About