2007
DOI: 10.1016/j.sse.2007.05.021
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The obtaining of Al–Ti10W90–Si(n) Schottky diodes and investigation of their interface surface states density

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Cited by 9 publications
(2 citation statements)
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“…For the fabrication of PtSi/n-Si (111) structures the method of planar technology and standard photolithography was used, traditionally used for the fabricating of the diodes with small geometrical sizes. Silicide film was deposited by the magnetron-sputtering method on single crystal n-type silicon (Pdoped) wafer Si (111), with 3 inch diameter, 0, 7 Ω•cm resistivity and 3, 5 μm thickness [26] . The condition of deposition process of Pt film with the thickness about 0, 6 μm is: the vacuum about 10 −4 Torr, as working gas was used Argon plasma, the temperature of preliminary heating of the substrate plates in chamber was 523 K during 250 s.…”
Section: Methodsmentioning
confidence: 99%
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“…For the fabrication of PtSi/n-Si (111) structures the method of planar technology and standard photolithography was used, traditionally used for the fabricating of the diodes with small geometrical sizes. Silicide film was deposited by the magnetron-sputtering method on single crystal n-type silicon (Pdoped) wafer Si (111), with 3 inch diameter, 0, 7 Ω•cm resistivity and 3, 5 μm thickness [26] . The condition of deposition process of Pt film with the thickness about 0, 6 μm is: the vacuum about 10 −4 Torr, as working gas was used Argon plasma, the temperature of preliminary heating of the substrate plates in chamber was 523 K during 250 s.…”
Section: Methodsmentioning
confidence: 99%
“…In our investigations the frequency of 500 kHz was used as the frequency of small AC signal (20 mV p-p ). In such case, it is possible a detection of a small contribution from surface states [3,4,24,26] .…”
Section: Methodsmentioning
confidence: 99%