The process of pore formation on a textured silicon substrate during electrochemical etching: 3D model

Abstract

The paper presents the results of modeling the mechanism for producing porous silicon on a textured surface. For various technological tasks, it is important to learn how to control the parameters of electrolytic etching to obtain the desired result. On 3D maps of the distribution of potential and etching currents, you can see that the vectors go around the pyramids and pointly etch certain sections of the surface. Confirmations of this can be seen in photographs of a scanning electron microscope and a scanning probe microscope. A detailed description of pore formation on textured porous silicon substrates has not yet been found in other works.

Investigation of electrical properties of photosensitive structures of reduced dimension based on silicon coated with rare earth fluorides

“…В данной работе показаны результаты исследования электрических свойств фоточувствительных структур со слоем наноструктурированного кремния и покрытием фторида диспрозия различной толщины. Методом анодного электрохимического травления на n-типе был сформирован пористый слой на всех образцах [4]. Травление проводилось в спиртовом растворе плавиковой кислоты.…”