2010
DOI: 10.1063/1.3481361
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Thermally compensated aluminum nitride Lamb wave resonators for high temperature applications

Abstract: In this letter, temperature compensation for aluminum nitride (AlN) Lamb wave resonators operating at high temperature is presented. By adding a compensating layer of silicon dioxide (SiO2), the turnover temperature can be designed for high temperature operation by varying the normalized AlN film thickness (hAlN/λ) and the normalized SiO2 film thickness (hSiO2/λ). With different designs of hAlN/λ and hSiO2/λ, the Lamb wave resonators were well temperature-compensated at 214 °C, 430 °C, and 542 °C, respectively… Show more

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Cited by 113 publications
(52 citation statements)
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“…The thicker the oxide film (see Stack 3), the smaller the predicted T Cf. Similar analysis was conducted in other works as well [21].…”
Section: ) Resonant Frequency and Temperature Dependencesupporting
confidence: 54%
“…The thicker the oxide film (see Stack 3), the smaller the predicted T Cf. Similar analysis was conducted in other works as well [21].…”
Section: ) Resonant Frequency and Temperature Dependencesupporting
confidence: 54%
“…Among various micro-electro-mechanical resonator technologies, aluminum nitride (AlN) Lamb wave resonators utilizing the lowest symmetric (S 0 ) mode have demonstrated the most promising technology for ultimately realizing this vision. [1][2][3][4][5] Recently, the robust temperature compensation of AlN Lamb wave resonators by using one layer of silicon dioxide [6][7][8] or highly doped silicon (Si) 9 has been demonstrated.…”
mentioning
confidence: 99%
“…In addition, several studies have proved that the material properties of multilayer plates can improve the resonator performances remarkably [12][13][14][15][16][17][18]. For example, the Q's of piezoelectric thin film resonators were significantly enhanced using a substrate layer with low acoustic losses, such as single crystal silicon (Si) [12,13].…”
Section: Introductionmentioning
confidence: 99%