Mass sensitivity of thin aluminum nitride (AlN) film S0 plate wave resonators is theoretically and experimentally studied. Here, two-port 888MHz synchronous thin film plate acoustic resonators (FPAR) are micromachined and subsequently coated with plasma-polymerized hexamethyldisiloxane (pp-HMDSO) thin films of various thicknesses. Systematic data on frequency shift and insertion loss versus film thickness are presented in a comparative manner. Measurements in gas phase environment are further presented in a comparative manner.