Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications

Barros, Anerise de; Albertin, K. F.; Miyoshi, Juliana Harumi; Dói, I.; Diniz, J. A.

doi:10.1016/j.mee.2009.06.020

Cited by 45 publications

(16 citation statements)

References 13 publications

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“…In our work, the Ti films are evaporated on Si substrates heated at 400 • C, which probably promotes the formation of an amorphous layer. Nemanich et al [31], along with references herein, also identified a strong interdiffusion of Si into 40 nm thick Ti layers during thermal annealing at 400 • C before the silicide is formed. The disordered structures are made out of Si, Ti and O.…”

Section: Formation Of Tisi and C 49 Tisisupporting

confidence: 56%

“…The band at 149 cm −1 corresponds to the most intense lattice vibration of the anatase phase [29]. In the same way, the band located at about 606 cm −1 corresponds to the rutile phase which usually shows the most intense Eg and A1g modes at 446 and 612 cm −1 [30,31]. The other bands of TiO2 of lower intensity are not detected.…”

Section: Formation Of Tio2 and Tin Compoundsmentioning

confidence: 83%

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Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

et al. 2017

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Abstract:The physical properties including the mechanical, optical and electrical properties of Ti nitrides and silicides are very attractive for many applications such as protective coatings, barriers of diffusion, interconnects and so on. The simultaneous formation of nitrides and silicides in Ti films improves their electrical properties. Ti films coated on Si wafers are heated at various temperatures and processed in expanding microwave (Ar-N 2 -H 2 ) plasma for various treatment durations. The Ti-Si interface is the centre of Si diffusion into the Ti lattice and the formation of various Ti silicides, while the Ti surface is the centre of N diffusion into the Ti film and the formation of Ti nitrides. The growth of silicides and nitrides gives rise to two competing processes which are thermodynamically and kinetically controlled. The effect of thickness on the kinetics of the formation of silicides is identified. The metastable C 49 TiSi 2 phase is the main precursor of the stable C 54 TiSi 2 phase, which crystallizes at about 600 • C, while TiN crystallizes at about 800 • C.

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Section: Formation Of Tisi and C 49 Tisisupporting

confidence: 56%

Section: Formation Of Tio2 and Tin Compoundsmentioning

confidence: 83%

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

et al. 2017

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“…Among many possible applications of TiO 2 one can specify: pigments (cosmetics, toothpaste, paints) [1,2], self -cleaning and sterilizing surfaces [3,4], water and air cleaning devices [5,6], microelectronic devices [7,8], food industry [9,10], systems of solar energy conversion [11,12], water splitting, hydrogen production and storage [13,14], photochromic devices [15] and gas sensors [16][17][18][19][20].…”

Section: Introductionmentioning

confidence: 99%

Hydrogen Sensor Of TiO2-Based Nanomaterials

Lyson-Sypien¹,

Zakrzewska²,

Gajewska³

et al. 2015

Archives of Metallurgy and Materials

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The aim of this research was to examine gas sensing properties of TiO 2 based nanomaterials. Nanopowders of Cr doped TiO 2 with constant Specific Surface Area, SSA, were obtained using Flame Spray Synthesis technique, FSS. Nanomaterials were characterized by Brunauer -Emmett -Teller adsorption isotherms, BET, X -ray diffraction, XRD, Transmission Electron Microscopy, TEM, optical spectrometry UV -vis with the use of an integrating sphere as well as impedance spectroscopy. Detection of hydrogen was carried out over the concentration range of 50 -3000 ppm at the temperatures extending from 200 to 400• C and synthetic air working as a reference atmosphere. As a result of experiments it appeared that incorporation of 5 at.% of Cr into TiO 2 improved hydrogen sensing features due to small crystallite size and predominance of rutile polymorphic phase.Keywords: TiO 2 nanomaterials, Cr dopant, hydrogen sensor Przedmiotem pracy są nanomateriały na bazie TiO 2 do zastosowań sensorowych. Nanoproszki TiO 2 domieszkowane chromem o stałej powierzchni właściwej SSA (ang. Specific Surface Area) otrzymano przy pomocy techniki syntezy w płomieniu FSS (ang. Flame Spray Synthesis). Materiały poddano charakteryzacji z wykorzystaniem: izoterm adsorpcyjnych Brunauer -Emmett -Teller, BET, dyfraktometrii rentgenowskiej, XRD, transmisyjnej mikroskopii elektronowej, TEM, spektroskopii optycznej UV -vis oraz spektroskopii impedancyjnej. Pomiar własności sensorowych został przeprowadzony dla koncentracji H 2 w zakresie 50-3000 ppm w przedziale temperatur 200-400• C. Wykazano, że najlepiej na wodór odpowiada próbka TiO 2 : 5at.% Cr charakteryzująca się małym rozmiarem krystalitów oraz przewagą fazy rutylu.

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“…In the case of evaporation, preferably electron beam evaporation, which is one of the most traditional methods because of high efficiency and low cost, is extensively used in scientific researches as well as in practical production. When TiO 2 films are prepared from TiO 2 starting material with the electronic beam evaporation method, the film is loose with a refractive index 1.9, which is obviously lower than the refractive index of the bulk [4][5][6]. According to the literature, Duyar et al reported that it is quite difficult to obtain films with reproducible and stable optical properties, in particular, for materials that exist in a number of different stoichiometric forms of the system Ti-O.…”

Section: Introductionmentioning

confidence: 99%

Optical and Structural Properties of Titanium Dioxide Films from and Starting Materials Annealed at Various Temperatures

Shei

2013

Advances in Materials Science and Engineering

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We investigated the optical and structural properties of titanium dioxide films deposited from and starting materials by electron beam evaporation at annealing temperatures from to . We find that the refractive index of as-deposited films from starting material is higher than that of as-deposited films from starting material. In addition, during thermal annealing, the refractive index fluctuates slightly as compared with films from starting material. This should be attributed to the fact that the deposited molecules had a higher packing density, such that the film was denser. The transmittance spectra of films from starting material indicate that transmittance edge slightly shifts to longer wavelength with the annealing temperature increasing when compared with starting material, in which the transmittance spectra indicate that the transmittance edge strongly shifts to longer wavelength with the same annealing temperature increasing. These findings should be attributed to the absence of oxygen and scattering of rough surface.

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Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications

Cited by 45 publications

References 13 publications

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Hydrogen Sensor Of TiO2-Based Nanomaterials

Optical and Structural Properties of Titanium Dioxide Films from and Starting Materials Annealed at Various Temperatures

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