2015
DOI: 10.1063/1.4938388
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Titanium nitride as a seed layer for Heusler compounds

Abstract: Titanium nitride (TiN) shows low resistivity at room temperature (27 mu Omega cm), high thermal stability and thus has the potential to serve as seed layer in magnetic tunnel junctions. High quality TiN thin films with regard to the crystallographic and electrical properties were grown and characterized by x-ray diffraction and 4-terminal transport measurements. Element specific x-ray absorption spectroscopy revealed pure TiN inside the thin films. To investigate the influence of a TiN seed layer on a ferro(i)… Show more

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Cited by 7 publications
(10 citation statements)
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“…The large number of oscillations prove the low roughness of the interfaces. This is due to the low roughness below 1 nm of the TiN buffer [14]. The similarity between both data sets also proves that the topology of the interfaces do not vary in the studied temperature range.…”
supporting
confidence: 60%
See 1 more Smart Citation
“…The large number of oscillations prove the low roughness of the interfaces. This is due to the low roughness below 1 nm of the TiN buffer [14]. The similarity between both data sets also proves that the topology of the interfaces do not vary in the studied temperature range.…”
supporting
confidence: 60%
“…The (002) superlattice and the fundamental (004) peak of Fe 1.5 CoGe can be observed already for the as-deposited state but they experience a strong intensity increase with the thermal treatment. The TiN layer acts as a seed layer and its role in improving growth has been reported also for other alloys [1,14]. Due to the similar lattice constant of TiN and MgO, the TiN film diffraction peaks are close to the substrate reflections and therefore difficult to separate.…”
mentioning
confidence: 98%
“…Here, it is worth mentioning that Ti L-edge consists of two features (L 3 and L 2 ) which arises due to the transition of core electron from Ti 2p3/2→Ti 3d and Ti 2p1/2→Ti 3d respectively [67]. Although, our obtained Ti L-edge features are not consistent with the literature reports [67,68] and clearly confirms the presence of surface oxidation which was in accordance with our XRR fitting. From Fig.…”
Section: Soft X-ray Absorption Spectroscopysupporting
confidence: 67%
“…The layer stacks for the Co 2 FeAl based MTJs consist of MgO (substrate)/TiN (20)/Co 2 FeAl (10)/MgO (2)/Co 40 Fe 40 B 20 (5)/Ta(3)/Ru (3) 42 (cf. Supplementary Note 1 ).…”
Section: Resultsmentioning
confidence: 99%
“…For a detailed explanation of the MTJ preparation, characterization of the MTJs after dielectric breakdown and details on the finite element method simulations please refer to the Supplementary Information and refs 5 , 31 , 42 .…”
Section: Methodsmentioning
confidence: 99%