2011
DOI: 10.1109/jstqe.2011.2108270
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Toward 1550-nm GaAs-Based Lasers Using InAs/GaAs Quantum Dot Bilayers

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Cited by 17 publications
(15 citation statements)
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“…The difference between the two QD layers is that the top layer QDs are the energy ground state of the system, therefore one can observe luminescence even at low carrier densities, because of the efficient feeding with carriers. The inequality of luminescence signal level of top and bottom QDs is also partly due to the suppressed feeding of the bottom layer QDs, as they are expected to be coupled to the top layer [9,11]. Higher excitation densities overcome this effect due to just filling the higher energy states of the entire system, and one can observe broad luminescence from the seed layer QDs in addition to the one from the top layer.…”
Section: Resultsmentioning
confidence: 99%
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“…The difference between the two QD layers is that the top layer QDs are the energy ground state of the system, therefore one can observe luminescence even at low carrier densities, because of the efficient feeding with carriers. The inequality of luminescence signal level of top and bottom QDs is also partly due to the suppressed feeding of the bottom layer QDs, as they are expected to be coupled to the top layer [9,11]. Higher excitation densities overcome this effect due to just filling the higher energy states of the entire system, and one can observe broad luminescence from the seed layer QDs in addition to the one from the top layer.…”
Section: Resultsmentioning
confidence: 99%
“…To extend the emission layer to longer wavelengths, the upper layer was covered with 4 nm layer of In 0.25 Ga 0.75 As to suppress the strain-enhanced indium and gallium intermixing in the top-layer QDs and then capped with 100 nm GaAs. Further details on the growth procedure can be found elsewhere [9].…”
Section: Methodsmentioning
confidence: 99%
“…To fabricate low-density InAs QDs by molecular beam epitaxy (MBE), some constructive schemes have been proposed, such as ultralow growth rate [3], high growth temperature [79], and precise control of deposition amount [10] of QDs and the isolation of QDs by growth on a mesa/hole-patterned substrate [11] or etching into micropillars [12, 13]. To extend their emission wavelength, several techniques have been developed, such as strain engineering of QDs [14], metamorphic structures [2], and strain-coupled bilayer QD (BQD) structure [1517]. BQD structure on GaAs substrate is effective to achieve emission above 1.3 μm.…”
Section: Introductionmentioning
confidence: 99%
“…These structures combine the advantage of mature fabrication and material processing technology with compatibility and straightforward integration. One of efficient methods to reach emission at 1.3 µm is to engineer the strain in InAs/GaAs QDs: usage of InGaAs strain reducing layer [1][2][3][4][5][6][7][8][9][10], bilayer of different-size QDs was the first layer acting as a seeding layer and modifying the strain conditions for the second one [11][12][13], increase of QD height by growth up to second critical thickness [14], or nitrization of InAs/GaAs QDs [15].…”
Section: Introductionmentioning
confidence: 99%