2007
DOI: 10.1063/1.2803937
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Tungsten nanocrystal memory devices improved by supercritical fluid treatment

Abstract: A supercritical CO2 (SCCO2) fluid technique is proposed to improve electrical characteristics for W nanocrystal nonvolatile memory devices, since the thickness and quality of tunnel oxide are critical issues for the fabrication of nonvolatile memory devices. After SCCO2 treatments, C-V curves are restored to normal, as well as the leakage current of W nanocrystal memory devices are reduced significantly. It reveals that W nanocrystal memory devices could be formed with shorter oxidation time, moreover, danglin… Show more

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Cited by 16 publications
(6 citation statements)
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“…8, these results reveled that the H 2 O molecules were operatively react in dangling bonds and traps of the SCCO 2 treated thin films after SCF treatment. The strong O 1s bonding of the as-deposited thin film after SCF treatment was observed [16]- [25]. Fig.…”
Section: Methodsmentioning
confidence: 93%
“…8, these results reveled that the H 2 O molecules were operatively react in dangling bonds and traps of the SCCO 2 treated thin films after SCF treatment. The strong O 1s bonding of the as-deposited thin film after SCF treatment was observed [16]- [25]. Fig.…”
Section: Methodsmentioning
confidence: 93%
“…On the other hand, after NH 3 plasma treatment, the traps in the surrounding dielectric could be passivated and therefore lateral migration of the stored carriers between NCs by trap-assistance tunneling could be reduced and consequently the charge retention was improved ). Despite the H 2 -annealing and plasma treatment, a supercritical CO 2 fluid technique having advantage of low thermal budget can also been applied to passivate traps in the dielectric to reduce leakage (Chen and Black 2007). According to ) the NC surface is a highly curved surface and therefore the Si lattice at surface is highly strained in comparison with the plane surface.…”
Section: Materials and Size-dependent Characteristics Of Qdsmentioning
confidence: 99%
“…[12][13][14] Especially, WSi 2 has a large work function of 4.8 eV, good chemical stability with the Si atom, and compatibility with the current semiconductor industry process due to its good thermal stability. [15][16][17] For these reasons, NFGM devices with WSi 2 nanocrystals are expected to exhibit good electrical performance and a smaller metal-diffusion problem compared to metallic nanocrystals because of their good thermal stability.…”
Section: Introductionmentioning
confidence: 99%