1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)
DOI: 10.1109/vlsit.1998.689206
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Ultra low power supply voltage (0.3 V) operation with extreme high speed using bulk dynamic threshold voltage MOSFET (B-DTMOS) with advanced fast-signal-transmission shallow well

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Cited by 16 publications
(13 citation statements)
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“…8(b). Since tends to have the similar temperature coefficient as , according to (6), tends to increase with temperature mainly due to the increase of and . For an nm device operating at weaker bias condition, i.e., V; however, tends to more deeply increase with increasing temperature than .…”
Section: A Channel Noise and Equivalent Thermal Resistancementioning
confidence: 96%
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“…8(b). Since tends to have the similar temperature coefficient as , according to (6), tends to increase with temperature mainly due to the increase of and . For an nm device operating at weaker bias condition, i.e., V; however, tends to more deeply increase with increasing temperature than .…”
Section: A Channel Noise and Equivalent Thermal Resistancementioning
confidence: 96%
“…The channel noise has a significant effect on the equivalent thermal resistance for conventioanl MOSFETs. In fact, by neglecting the body trans-conductance, for DT MOSFETs would be approximately the same as that for conventional MOS-FETs as expressed in the following: (6) where K is the reference temperature. Note that (6) indicates that in the low regime, the body-related parasitics would have little influence on .…”
Section: A Channel Noise and Equivalent Thermal Resistancementioning
confidence: 99%
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“…Successful DTMOS based circuit implementations have been realized in silicon on insulator (SOI) processes, even though it is possible to implement DTMOS devices in bulk silicon processes. In fact in 1998, Shibata et al [48] demonstrated high speed operation at ultra low V DD using Bulk Dynamic Threshold MOSFET (B-DTMOS). The process involves manufacturing MOSFETS with shallow wells and high impurity concentration layers between low impurity concentration layers (to reduce signal transmission delay due to body resistance).…”
Section: Dynamic Threshold Mos (Dtmos)mentioning
confidence: 99%
“…The benefits of the approach are evident even over the region of ultra low V DD and low V th , where forward bias effect is weak. An experimental 61-stage ring oscillator was shown to have a delay of 182 ps per stage at a 0.3 V power supply [48]. Soeleman et al have shown that the energy delay product of DTMOS is comparable to that of subthreshold CMOS, with DTMOS offering higher speeds [49].…”
Section: Dynamic Threshold Mos (Dtmos)mentioning
confidence: 99%