2015
DOI: 10.1002/adma.201503873
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Ultrathin SnSe2 Flakes Grown by Chemical Vapor Deposition for High‐Performance Photodetectors

Abstract: High-quality ultrathin single-crystalline SnSe2 flakes are synthesized under atmospheric-pressure chemical vapor deposition for the first time. A high-performance photodetector based on the individual SnSe2 flake demonstrates a high photoresponsivity of 1.1 × 10(3) A W(-1), a high EQE of 2.61 × 10(5)%, and superb detectivity of 1.01 × 10(10) Jones, combined with fast rise and decay times of 14.5 and 8.1 ms, respectively.

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Cited by 512 publications
(436 citation statements)
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“…The hole mobility ( µ ) of the device can be calculated by μ=dIdsdVdsLWCnormaliVds, where W and L are the width and length of the device, and C i is the capacitance per unit area (11.6 nF cm −2 for 300 nm SiO 2 layer in these experiments). The calculated on/off ratio and µ are ≈10 3 and 0.8 cm 2 V −1 s −1 at room temperature with V ds = 1 V, which are comparable with those of reported MoS 2 ,41 SnSe 2 ,28 and SnS 2 25, 42 FETs recently. To further explore the charge transport mechanism, we employed the carrier injection models such as thermionic emission and tunneling 43, 44, 45.…”
Section: Resultssupporting
confidence: 89%
“…The hole mobility ( µ ) of the device can be calculated by μ=dIdsdVdsLWCnormaliVds, where W and L are the width and length of the device, and C i is the capacitance per unit area (11.6 nF cm −2 for 300 nm SiO 2 layer in these experiments). The calculated on/off ratio and µ are ≈10 3 and 0.8 cm 2 V −1 s −1 at room temperature with V ds = 1 V, which are comparable with those of reported MoS 2 ,41 SnSe 2 ,28 and SnS 2 25, 42 FETs recently. To further explore the charge transport mechanism, we employed the carrier injection models such as thermionic emission and tunneling 43, 44, 45.…”
Section: Resultssupporting
confidence: 89%
“…Generally, the preparation methods can be classified into top‐down and bottom‐up methods, such as mechanical exfoliation,72, 92, 116 solvothermal method,97, 129, 140, 141 vapor deposition,69, 76, 118, 142 atomic layer deposition,126, 143 and so on. In the following context, we will focus on four methods.…”
Section: Preparation Methods and Characterizationsmentioning
confidence: 99%
“…Recently, Zhai and co‐workers76 adopted a newly Sn precursor (SnI 2 ) and achieved large area of SnSe 2 nanosheets with ultrathin thickness. They considered that SnI 2 takes some advantages over other solid precursors such as low melting point (≈320 °C), which may providing more uniform and stable growth conditions during CVD procedure for the growth of ultrathin SnSe 2 flakes.…”
Section: Preparation Methods and Characterizationsmentioning
confidence: 99%
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