2007 IEEE International Electron Devices Meeting 2007
DOI: 10.1109/iedm.2007.4418975
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Understanding Random Threshold Voltage Fluctuation by Comparing Multiple Fabs and Technologies

Abstract: Random threshold voltage (VTH) fluctuation data obtained

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Cited by 176 publications
(109 citation statements)
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“…However, aggressive scaling of CMOS technology presents a number of distinct challenges for embedded memory fabrics. For instance, smaller feature sizes imply a greater impact of process and design variability, including random threshold voltage (V TH ) variations, originating from the fluctuation in number of dopants and poly-gate edge roughness [Mahmoodi et al, 2005;Takeuchi et al, 2007]. The process and design variability leads to a greater loss of parametric yield with respect to SRAM bitcell noise margins and bitcell read currents when a large number of devices are integrated into a single die.…”
Section: Sram Bitcell Topologiesmentioning
confidence: 99%
“…However, aggressive scaling of CMOS technology presents a number of distinct challenges for embedded memory fabrics. For instance, smaller feature sizes imply a greater impact of process and design variability, including random threshold voltage (V TH ) variations, originating from the fluctuation in number of dopants and poly-gate edge roughness [Mahmoodi et al, 2005;Takeuchi et al, 2007]. The process and design variability leads to a greater loss of parametric yield with respect to SRAM bitcell noise margins and bitcell read currents when a large number of devices are integrated into a single die.…”
Section: Sram Bitcell Topologiesmentioning
confidence: 99%
“…The impurity concentration is fluctuated by random dopant fluctuations (RDFs), which leads to variation. Reference [21] reports that the fluctuations of are mainly caused by RDFs. Thus the fluctuation of , which is a function of , should be considered for variations.…”
Section: B Modeling Of Body-bias Effectmentioning
confidence: 99%
“…On the other hand, as the dimensions of MOSFETs are scaled into the nanometer regime, fluctuations in device characteristics due to variations in gate length, discrete dopant fluctuations, line-edge roughness, and so on have become serious problems [3][4][5]. Moreover, the presence of current noise in MOSFETs has recently become a problem even in digital circuits [6].…”
Section: Introductionmentioning
confidence: 99%