“…Thermal failure can occur because of thermal runaway in each of the current components I dMOS ; I c or I ii . The temperature coefficient of I dMOS depends on V gs [17], I ii has a slightly-negative temperature coefficient [18] (not included in the model), and I c has a positive temperature coefficient [19]. In most cases, the increase in I c (also including thermal leakage) induced by self-heating determines thermal instability [2,3,5,8].…”
Section: Origin Of Electro-thermal Runawaymentioning
confidence: 97%
“…The condition (2) corresponds to the thermal runaway condition discussed in Section 3.2. However, in this case, the expression for the temperature coefficient / d is not given by (19), which only accounts for thermal phenomena, but by (28), which also accounts for the electrical feedback occurring at the base node of the bipolar. For this reason, it is natural to define the electro-thermal stability factor as (compare with (18)):…”
Section: Derivation Of the Electro-thermal Stability Factormentioning
“…Thermal failure can occur because of thermal runaway in each of the current components I dMOS ; I c or I ii . The temperature coefficient of I dMOS depends on V gs [17], I ii has a slightly-negative temperature coefficient [18] (not included in the model), and I c has a positive temperature coefficient [19]. In most cases, the increase in I c (also including thermal leakage) induced by self-heating determines thermal instability [2,3,5,8].…”
Section: Origin Of Electro-thermal Runawaymentioning
confidence: 97%
“…The condition (2) corresponds to the thermal runaway condition discussed in Section 3.2. However, in this case, the expression for the temperature coefficient / d is not given by (19), which only accounts for thermal phenomena, but by (28), which also accounts for the electrical feedback occurring at the base node of the bipolar. For this reason, it is natural to define the electro-thermal stability factor as (compare with (18)):…”
Section: Derivation Of the Electro-thermal Stability Factormentioning
“…This reduces the minimum required metal track width for preventing electromigration. The devices are scaled such that both operate near peak G max current density and in their "safe operating area" (SOA) regarding electro-thermal breakdown [4]. This resulted in a HV-CB device with a 0.4x20.4x20μm emitter area, which is a factor 2.5 larger than the LV-CE emitter area (0.4x20.4x8μm).…”
This paper describes an 8-way in-phase current combining power amplifier (PA) for Ka-band applications implemented in a 0.25um SiGe:C BiCMOS technology. The PA achieves a saturated output power of 29.7dBm at 27GHz with a maximum PAE of 10.5%. After applying load-pull, this output power increases further to a level of 31dBm with a maximum PAE of 13%. The small-signal gain is 24.5dB and the saturated gain is more than 14.7dB in the band of interest. The consumed area is only 2.83mm 2 .
“…In this manner, the number of carriers injected into the high CB electric field is very well controlled. Although this approach may seem a rather unlikely configuration, it eliminates the problem of thermal runaway, as in the case of a forced base-and collector-voltage configuration [8]. Another way to assess mixed-mode damage is called the mixed-mode current sweep, which will be described in a later section.…”
Using mixed-mode annealing to help evaluate the responses of modern bipolar transistors, we compare the damage processes associated with X-ray irradiation-induced and hot carrier-induced damage in SiGe HBTs. Stress and radiation measurements indicate that the by-products of both X-ray irradiation-induced and hot carrier-induced trap reactions are identical. We use calculations to better understand the operative damage mechanisms, and find that a hydrogen reaction-diffusion model can predict the observed characteristics of our measurements. Calculations indicate that the transport of hydrogen molecules inside the emitter-base oxides determines the trap generation and recovery processes.
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