X-ray reflectivity study of radio frequency sputtered silicon oxide on silicon

Solina, Danica; Cheary, R.W.; Kalceff, W.; McCredie, G.

doi:10.1016/j.tsf.2005.04.092

Cited by 4 publications

(2 citation statements)

References 34 publications

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“…26 The thickness of the external layer is reduced by about 3 Å and then remains constant in the final stage of cleaning. We analyzed these XR data ͑not shown͒ in a three-layer model: external layer/ TiO 2 / SiO 2 on top of the silicon substrate.…”

Section: Role Of Water Adsorption In Photoinduced Superhydrophilicitymentioning

confidence: 99%

Role of water adsorption in photoinduced superhydrophilicity on TiO2 thin films

Lee

Andreatta

Benattar

2007

Applied Physics Letters

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The ultraviolet (UV) irradiation of a titanium dioxide (TiO2) film surface gives rise to two simultaneous phenomena: photocatalysis and superhydrophilicity. Photocatalysis has been thoroughly studied, but the mechanism governing superhydrophilicity remains controversial. The authors’ investigations show the effects induced by UV irradiation on the water adsorption and desorption on the TiO2 surface. The observations prove that superhydrophilicity cannot be solely induced by the removal of organic contamination via photocatalysis, but is associated with water adsorption most probably due to the appearance of hydroxyl groups on surface defects.

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Section: Role Of Water Adsorption In Photoinduced Superhydrophilicitymentioning

confidence: 99%

Role of water adsorption in photoinduced superhydrophilicity on TiO2 thin films

Lee

Andreatta

Benattar

2007

Applied Physics Letters

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“…Los datos experimentales se han ajustado con el software comercial RCREFSimW de IHP [Zaumseil]. Este software permite obtener la densidad de las láminas, así como su espesor a partir del ángulo crítico [Solina05]. La densidad obtenida para las láminas con alta velocidad de ataque es de 1,9 g/cm 3 , cerca de un 15% menor que la densidad típica del óxido térmico SiO 2 (2,2 g/cm 3 ).…”

Section: Número De Onda (Cmunclassified

Tecnologías de fabricación de microsistemas electromecánicos actuados piezoeléctricamente con nitruro de aluminio

Castilla¹

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4.4 Caracterización dinámica de microrresonadores piezoeléctricos……….. 4.4.1 Caracterización mediante el sistema de interferometría láser… 4.4.2 Comparación de las medidas de interferometría láser con la . simulación por elementos finitos……………………………………. 4.4.3 Caracterización mediante vibrometría láser de barrido……….. 4.4.4 Caracterización de microrresonadores piezoeléctricos mediante técnicas eléctricas………………………………………….

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