[1993] Proceedings IEEE Micro Electro Mechanical Systems
DOI: 10.1109/memsys.1993.296951
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YAG laser assisted etching for releasing silicon micro structure

Abstract: YAG laser assisted etching techniques were developed and investigated for releasing silicon micro structures. HC1,SF6 etc., which produce volatile exhaust, were used as etching gas at atmospheric pressure. The YAG laser assisted etching w a s a p p l i e d t o f a b r i c a t e a n electrostatic m i c r o a c t u a t o r , a r e s o n a t i n g s e n s o r a n d a ccelerometers. This resistless dry etching can be applied to threedimensional structures.

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Cited by 8 publications
(6 citation statements)
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“…Many works have proposed modeling techniques to predict capillary force self-assembly and stiction in MEMS. For instance, calculations and simulations of stiction failure of cantilevers are the subject of an abundant literature [17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35]. Static [5,6] and dynamic [7] models have been computed to explain and ameliorate the massive parallel fluidic self-assembly of microparts.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Many works have proposed modeling techniques to predict capillary force self-assembly and stiction in MEMS. For instance, calculations and simulations of stiction failure of cantilevers are the subject of an abundant literature [17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35]. Static [5,6] and dynamic [7] models have been computed to explain and ameliorate the massive parallel fluidic self-assembly of microparts.…”
Section: Resultsmentioning
confidence: 99%
“…Stiction is often considered as one of the most critical reliability issue and fabrication failure in MEMS technology [27]. In order to prevent microstructures collapse during sacrificial etching and the contact of moving parts, judicious antistiction treatments such as solvent rinses at elevated temperature [26,27,29] and chemical coatings [30][31][32], or antistiction microstructures such as tabs [33] or temporary support structures [34,35] had been employed. On the opposite, stiction can be controllably used to position and lock on a substrate 3D self-assembled microsystems.…”
Section: Introductionmentioning
confidence: 99%
“…Minami et al (1993)] Laser assisted silicon etcing has been developed and applied for three-axis accelerometer and resonators described above.…”
Section: Laser Assisted Etchingmentioning
confidence: 99%
“…The operation of different types of gas lasers, such as the Argon-ion laser, Excimer laser, and CO 2 laser [8 -12], depends on its emission wavelength and output power. Laser systems with different laser sources, such as the carbon dioxide (CO 2 ) laser [11], Excimer ultraviolet laser [8], Nd:YAG solid-state laser [13][14][15], Yb:YAG disc laser [9], and Yb fiber laser [1], are also suitable for silicon etching.…”
Section: Introductionmentioning
confidence: 99%
“…The interaction between laser ablation and the surface being etched depends largely on the laser beam parameters, as well as the physical and chemical properties of the silicon. Therefore, proper methods of conducting laser source selection and laser parameter optimization are important to minimize sample damage [14,16].…”
Section: Introductionmentioning
confidence: 99%