Optimal dimensions are found for the silicon waveguide in an electro-optic (EO) polymer cladding-based silicon waveguide modulator. The confinement factor as well as the effective index of the mode are taken into account. The influence of the coplanar electrode spacing and electrode height on performance are examined and a figure of merit formula for choosing the optimal device geometry is shown. The design space for both 1550 nm and 1310 nm wavelengths is explored. With the optimal 275 nm waveguide width and 4 μm electrode spacing, a V π of a few volts can be achieved even with moderate r 33 EO polymers. Experimental results on a fabricated modulator are shown and compared with the predicted performance.

We explore the design space for optimizing CMOS compatible waveguide crossings on a silicon photonics platform. This paper presents simulated and experimental excess loss and crosstalk suppression data for vertically integrated silicon nitride over silicon-on-insulator waveguide crossings. Experimental results show crosstalk suppression exceeding -49/-44 dB with simulation results as low as -65/-60 dB for the TE/TM mode in a waveguide crossing with a 410 nm vertical gap.

We report low insertion loss single polarization and polarization splitting grating couplers obtained on a 300mm silicon photonics platform through the fabrication of a low-cost Bragg reflector on a double SOI substrate.

We review Sandia's silicon photonics platform for national security applications. Silicon photonics offers the potential for extensive size, weight, power, and cost (SWaP-c) reductions compared to existing III-V or purely electronics circuits. Unlike most silicon photonics foundries in the US and internationally, our silicon photonics is manufactured in a trusted environment at our Microsystems and Engineering Sciences Application (MESA) facility. The Sandia fabrication facility is certified as a trusted foundry and can therefore produce devices and circuits intended for military applications. We will describe a variety of silicon photonics devices and subsystems, including both monolithic and heterogeneous integration of silicon photonics with electronics, that can enable future complex functionality in aerospace systems, principally focusing on communications technology in optical interconnects and optical networking.

Coatings or films are applied to a substrate for several applications, such as waterproofing, corrosion resistance, adhesion performance, cosmetic effects, and optical coatings. When applying a coating to a substrate, it is vital to monitor the coating thickness during the coating process to achieve a product to the desired specification via real time production control. There are several different coating thickness measurement methods that can be used, either in-line or off-line, which can determine the coating thickness relative to the material of the coating and the substrate. In-line coating thickness measurement methods are often very difficult to design and implement due to the nature of the harsh environmental conditions of typical production processes and the speed at which the process is run. This paper addresses the current and novel coating thickness methodologies for application to chromium coatings on a ferro-magnetic steel substrate with their advantages and limitations regarding in-line measurement. The most common in-line coating thickness measurement method utilized within the steel packaging industry is the X-ray Fluorescence (XRF) method, but these systems can become costly when implemented for a wide packaging product and pose health and safety concerns due to its ionizing radiation. As technology advances, nanometer-scale coatings are becoming more common, and here three methods are highlighted, which have been used extensively in other industries (with several variants in their design) which can potentially measure coatings of nanometer thickness in a production line, precisely, safely, and do so in a non-contact and non-destructive manner. These methods are optical reflectometry, ellipsometry and interferometry.