We examine the pressure behavior of two S-induced deep levels, which arise from negatively charged broken-bond {DX~) and on-site {D~) geometries, in GaAs and InP, and find the DX~ state to be the ground state over the D~ and shallow donor states at pressures of 18 and 88 kbar, respectively, in good agreement with experimental data. The DX~ state is characterized by the conduction band structure, while the formation of the D~ state is closely related to the local chemical bonding, exhibiting the semiconductor-dependent pressure variation.
We discuss the central issues to be addressed for realizing carbon nanotube (CNT)
nanoelectronics. We focus on selective growth, electron energy bandgap engineering and
device integration. We have introduced a nanotemplate to control the selective growth,
length and diameter of CNTs. Vertically aligned CNTs are synthesized for developing a
vertical CNT-field effect transistor (FET). The ohmic contact of the CNT/metal
interface is formed by rapid thermal annealing. Diameter control, synthesis of
Y-shaped CNTs and surface modification of CNTs open up the possibility for
energy bandgap modulation. The concepts of an ultra-high density transistor
based on the vertical-CNT array and a nonvolatile memory based on the top
gate structure with an oxide–nitride–oxide charge trap are also presented. We
suggest that the deposited memory film can be used for the quantum dot storage
due to the localized electric field created by a nano scale CNT-electron channel.
Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters.
We have fabricated a single-wall carbon-nanotube (CNT)-based nonvolatile memory device using SiO2–Si3N4–SiO2 (ONO) layers as a storage node. The memory device is composed of a top gate structure with a channel width of a few nanometers and the ONO layer embedded between CNT and gate electrode. When the bias voltage between the CNT and gate electrode increases to 4 V, charges are tunneled out from CNT surfaces and captured to the traps in the ONO layers. Stored charges on the trap sites make the threshold voltage shift of 60 mV and is independent of charging time, suggesting that the ONO has traps with a quasiquantized energy state. The quantized state is related to the localized high electric field associated with CNT channel. The CNT-field-effect transistor with an ONO storage node could be used for an ultrahigh-density nonvolatile memory.
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