The recent discovery of nanoelectronics memristor devices has opened up a new wave of enthusiasm and optimism in revolutionizing electronic circuit design, marking the beginning of new era for the advancement of neuromorphic, high‐density logic and memory applications. Here a highly non‐linear dynamic response of a bio‐memristor is demonstrated using natural silk cocoon fibroin protein of silkworm, Bombyx mori. A film that is transparent across most of the visible spectrum is obtained with the electronic‐grade silk fibroin aqueous solution of ca. 2% (wt/v). Bipolar memristive switching is demonstrated; the switching mechanism is confirmed to be the filamentary switching as observed by probing local conduction behavior at nanoscale using scanning tunneling microscopy. The memristive transition is elucidated by a physical model based on the carrier trapping or detrapping in silk fibroin films and this appears to be due to oxidation and reduction procedures, as evidenced from cyclic voltammetry measurements. Hence, silk fibroin protein could be used as a biomaterial for bio‐memristor devices for applications in advanced bio‐inspired very large scale integration circuit design as well as in biologically inspired synapse links for energy‐efficient neuromorphic computing.

The purpose of this review article is to report on the recent developments and the performance level achieved in the strained-Si/SiGe material system. In the first part, the technology of the growth of a high-quality strained-Si layer on a relaxed, linear or step-graded SiGe buffer layer is reviewed. Characterization results of strained-Si films obtained with secondary ion mass spectroscopy, Rutherford backscattering spectroscopy, atomic force microscopy, spectroscopic ellipsometry and Raman spectroscopy are presented. Techniques for the determination of bandgap parameters from electrical characterization of metal-oxide-semiconductor (MOS) structures on strained-Si film are discussed. In the second part, processing issues of strained-Si films in conventional Si technology with low thermal budget are critically reviewed. Thermal and low-temperature microwave plasma oxidation and nitridation of strained-Si layers are discussed. Some recent results on contact metallization of strained-Si using Ti and Pt are presented. In the last part, device applications of strained Si with special emphasis on heterostructure metal oxide semiconductor field effect transistors and modulation-doped field effect transistors are discussed. Design aspects and simulation results of n-and p-MOS devices with a strained-Si channel are presented. Possible future applications of strained-Si/SiGe in high-performance SiGe CMOS technology are indicated.

Natural silk fibroin protein has been used for the fabrication of bio-memristors. The origin of the resistive switching characteristics is investigated in detail. The conduction mechanism in silk protein is found to be controlled by multi-charge transport mechanisms along with filamentary type conduction process. The redox process via hopping mechanism is found to be responsible for charge transport in silk protein. The lowfrequency noise (LFN) study reveals that the fluctuation in the current level is due to the traps existing near the conducting filaments (CFs). It is shown for the first time that the amide I region is mainly responsible for the conductivity change in silk fibroin protein-based bio-memristors under appropriate bias (polarity and magnitude) condition.

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