Integration of electronics and photonics for future applications requires an efficient conversion of electrical to optical signals. The excellent electronic and photonic properties of graphene make it a suitable material for integrated systems with extremely wide operational bandwidth. In this paper, we analyze the novel geometry of modulator based on the rib photonic waveguide configuration with a double-layer graphene placed between a slab and ridge. The theoretical analysis of graphene-based electro-absorption modulator was performed showing that a 3 dB modulation with ~ 600 nm-long waveguide is possible resulting in energy per bit below 1 fJ/bit. The optical bandwidth of such modulators exceeds 12 THz with an operation speed ranging from 160 GHz to 850 GHz and limited only by graphene resistance. The performances of modulators were evaluated based on the figure of merit defined as the ratio between extinction ratio and insertion losses where it was found to exceed 220.

CMOS platforms operating at the telecommunications wavelength either reside within the highly dissipative two-photon regime in silicon-based optical devices, or possess small nonlinearities. Bandgap engineering of non-stoichiometric silicon nitride using state-of-the-art fabrication techniques has led to our development of USRN (ultra-silicon-rich nitride) in the form of Si7N3, that possesses a high Kerr nonlinearity (2.8 × 10−13 cm2 W−1), an order of magnitude larger than that in stoichiometric silicon nitride. Here we experimentally demonstrate high-gain optical parametric amplification using USRN, which is compositionally tailored such that the 1,550 nm wavelength resides above the two-photon absorption edge, while still possessing large nonlinearities. Optical parametric gain of 42.5 dB, as well as cascaded four-wave mixing with gain down to the third idler is observed and attributed to the high photon efficiency achieved through operating above the two-photon absorption edge, representing one of the largest optical parametric gains to date on a CMOS platform.

CMOS‐compatible nonlinear optics platforms with negligible nonlinear losses and high nonlinearity are of great merit. Silicon, silicon nitride and Hydex glass have made significant headway in nonlinear optical signal processing, though none of these platforms possesses the highly sought after combination of high nonlinearity and negligible nonlinear losses. In this manuscript, we present a nonlinear optics platform based on silicon‐rich nitride, deposited at a low temperature of 250°C compatible with back‐end CMOS processing. The silicon‐rich nitride is designed and engineered in composition to have a bandgap of 2.05 eV, such that the two‐photon absorption edge is well below 1.55 μm. The designed and developed waveguides have a nonlinear parameter of 550 W−1/m, 500 times larger than that in silicon nitride waveguides, while at the same time not possessing two‐photon and free‐carrier losses. Using 500‐fs pulses, we generate supercontinuum exceeding 0.6 of an octave.

The group velocity dispersion (GVD) of silicon nitride waveguides, prepared using plasma enhanced chemical vapor deposition, is studied and characterized experimentally in support of nonlinear optics applications. We show that the dispersion may be engineered by varying the geometry of the waveguide and demonstrate measured anomalous GVD values as high as −0.57 ps2/m and normal GVD values as high as 0.86 ps2/m. We also experimentally demonstrate the absence of any observed nonlinear loss at the telecommunications wavelength at peak intensities of up to 12 GW/cm2. Spectral broadening due to self phase modulation in silicon nitride waveguides with a nonlinear parameter of 1.4 W−1/m is also demonstrated.

Silicon based nonlinear photonics has been extensively researched at telecom wavelengths in recent years. However, studies of Kerr nonlinearity in silicon at mid-infrared wavelengths still remain limited. Here, we report the wavelength dependency of third-order nonlinearity in the spectral range from 1.6 μm to 6 μm, as well as multi-photon absorption coefficients in the same range. The third-order nonlinear coefficient n2 was measured with a peak value of 1.65 × 10(−13) cm2/W at a wavelength of 2.1 μm followed by the decay of nonlinear refractive index n2 up to 2.6 μm. Our latest measurements extend the wavelength towards 6 μm, which show a sharp decrement of n2 beyond 2.1 μm and steadily retains above 3 μm. In addition, the analysis of three-photon absorption and four-photon absorption processes are simultaneously performed over the wavelength range from 2.3 μm to 4.4 μm. Furthermore, the effect of multi-photon absorption on nonlinear figure of merit in silicon is discussed in detail.