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Plane shock wave experiments were conducted to determine the strength and elastic response of natural and synthetic diamond single crystals shocked along [100] to peak elastic stresses of ∼90 and ∼120 GPa. Velocity interferometry was used to measure particle velocity histories and shock velocities in the diamond samples. The maximum elastic wave amplitudes (89±3 GPa) for both crystal types were comparable. This value corresponds to shear stresses of 30 and 35 GPa (∼G/15) for the (111) [11¯0] and (111) [21¯1¯] slip systems, respectively. Surprisingly, the elastic limit (57±3 GPa) was lower for the higher peak stress. The elastic constant C111 was experimentally determined to be −7804±653 GPa.

Understanding and quantifying the strength or elastic limit of diamond single crystals is of considerable scientific and technological importance, and has been a subject of long standing theoretical and experimental interest. To examine the effect of crystalline anisotropy on strength and deformation of shocked diamond single crystals, plate impact experiments were conducted to measure wave profiles at various elastic impact stresses up to ~120 GPa along [110] and [111] crystal orientations. Using laser interferometry, particle velocity histories and shock velocities in the diamond samples were measured and were compared with similar measurements published previously for shock compression along the [100] direction. Wave profiles for all three orientations showed large elastic wave amplitudes followed by time-dependent inelastic deformation. From the measured wave profiles, the elastic limits were determined under well characterized uniaxial strain loading conditions. The measured elastic wave amplitudes for the [110] and [111] orientations were lower for higher elastic impact stress (stress attained for an elastic diamond response), consistent with the result reported previously for [100] diamond. The maximum resolved shear stress (MRSS) on the {111}<110> slip systems was determined for each orientation, revealing significant orientation dependence. The MRSS values for the [100] and [110] orientations (~33 GPa) are 25-30% of theoretical estimates; the MRSS value for the [111] orientation is significantly lower (~23 GPa). Our results demonstrate that the MRSS depends strongly on the stress component normal to the {111} planes or the resolved normal stress (RNS), suggesting that the RNS plays a key role in inhibiting the onset of inelastic deformation. Lower elastic wave amplitudes at higher peak stress and the effect of the RNS are inconsistent with typical dislocation slip mechanisms of inelastic deformation, suggesting instead an inelastic response characteristic of shocked brittle solids. The present results show that the

The influence of plasma treatment of polycarbonate (PC) substrates on the morphological, electrical, and adhesion properties of deposited amorphous transparent indium zinc oxide (IZO) by direct current magnetron sputtering was investigated by analyzing atomic force microscopy, contact angles, Hall, and nano‐scratch measurements. The surfaces of PC substrates were performed by plasma treatment at various processing times in Ar/O2 mix atmosphere. The atomic force microscopy images indicated that the microstructure of the substrates considerably influenced the surface morphology of deposited IZO films, and the least surface roughness of IZO was obtained after 5‐s plasma treatment. The IZO film deposited on PC with 5‐s plasma treatment presented an improved electrical conductivity and thermal stability after annealing at 120 °C in air, whereas the significant decrease in carrier concentration and increase in resistivity with extending plasma treatment time were observed, which was attributed to the elevated oxygen adsorption during annealing for a loosely packed structure. Moreover, the adhesion properties of IZO films with PC substrates decreased after 30‐s plasma treatment because of the significant difference on the surface polarity between the PC and thin films and the increased roughness caused by plasma etching. Copyright © 2016 John Wiley & Sons, Ltd.

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