The surface chemistry of 1,1,1,5,5,5-hexafluoro-2,4-pentanedione (hfacH), a hydrogenated form of the most common ligand in metal and metal oxide deposition, on Si(100)-2x1 has been investigated using multiple internal reflection Fourier transform infrared spectroscopy (MIR-FTIR), Auger electron spectroscopy (AES), thermal desorption mass spectrometry, and computational analysis. The main goal of these studies was to understand if hfacH is a source of fluorine, carbon, and oxygen contamination for a variety of deposition processes where the hfac ligand is involved. In its molecular form, hfacH may potentially have up to 10 isomers including two ketonic and eight enolic forms. One of the enolic forms is shown to be the most stable upon adsorption on a clean Si(100)-2x1 surface at submonolayer coverages at cryogenic temperatures. Even though only the enolic form is present at cryogenic temperatures, at room temperature any of these isomers can exist and all the possibilities of their interaction with the Si(100)-2x1 surface, including several [2 + 2] and [2 + 4] addition pathways as well as O-H dissociation, should be considered. Despite such an array of possibilities, the room-temperature adsorption is governed by the thermodynamic stability of the final addition products between the hfacH and silicon surface. These adducts are stable at room temperature and decompose upon surface annealing.

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This paper presents the first molecular level investigation of chemical reactivity of a surface of an amorphous diffusion barrier film deposited on a Si(100)-2 x 1 single crystal. Vinyltrimethylsilane (VTMS) is chosen as a probe molecule because of its chemical properties and because of its role as a ligand in a common copper deposition precursor, hexafluoroacetylacetonato-copper-vinyltrimethylsilane, (hfac)Cu(VTMS). The surface chemistry of vinyltrimethylsilane on titanium carbonitride-covered Si(100)-2 x 1 has been investigated using multiple internal reflection Fourier transform infrared spectroscopy (MIR-FTIR), Auger electron spectroscopy (AES), thermal desorption mass spectrometry, and computational analysis. On a film with nominal surface stoichiometry TiC(x)N(y) (x approximately y approximately 1) preannealed to 800 K, VTMS adsorbs molecularly at cryogenic temperatures even at submonolayer coverages; the major pathway for its temperature-programmed evolution is desorption. Adsorption at room temperature leads to chemisorption via a double-bond attachment. A set of computational models was designed to investigate the possible adsorption sites for a VTMS molecule on a TiCN-covered Si(100)-2 x 1 surface. A comparison of the computational predictions for a variety of possible adsorption sites with the results of thermal desorption and infrared measurements suggests that approximately 90% of the adsorbed VTMS is chemisorbed along the Ti-C bond while approximately 10% is chemisorbed on a Ti corner atom, the minority site of the surface. The Ti-N bond is not participating in the chemisorption process.

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