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The InGaZnO thin films are fabricated on the quartz glass using pulsed laser deposition (PLD), where the target is prepared by mixing the Ga(2)O(3), In(2)O(3), and ZnO powders at a mol ratio of 1:1:8 before the solid-state reactions in a tube furnace at the atmospheric pressure. The product thin films were characterized comprehensively by X-ray diffraction, atomic force microscopy, Hall-effect investigation, and X-ray photoelectron spectroscopy. Thus, we demonstrate semiconductor thin-film materials with high smoothness, high transmittance in visible region, and excellent electrical properties.

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The Nb-doped β-Ga 2 O 3 (β-Ga 2 O 3 :Nb) thin films have been deposited on the Si and quartz substrates by radio-frequency magnetron technique in argon ambient. The effects of annealing atmosphere on the structural and optical properties of β-Ga 2 O 3 :Nb thin films have been investigated. The crystallinity of β-Ga 2 O 3 :Nb film is improved obviously after annealing. An increase in surface roughness is observed on annealed films. The bandgap from 5.19 to 5.26 eV is obtained after annealing in different atmosphere, which is larger than the 5.09 eV before annealing. Moreover, the red-shift of photoluminescence emission peak is observed after annealing, and the annealing atmosphere has an influence on the peak intensity.

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