We present a versatile scheme dedicated to exerting strong electric fields up to 0.5 MV/cm on color centers in hexagonal silicon carbide, employing transparent epitaxial graphene electrodes. In both the axial and basal direction equally strong electric fields can be selectively controlled. Investigating the silicon vacancy (VSi) in ensemble photoluminescence experiments, we report Stark splitting of the V1′ line of 3 meV by a basal electrical field and a Stark shift of the V1 line of 1 meV in an axial electric field. The spectral fine-tuning of the VSi, being an important candidate for realizing quantum networks, paves the way for truly indistinguishable single-photon sources.

We report on the generation and annihilation of color centers in 4H silicon carbide (SiC) by proton irradiation and subsequent annealing. Using low-temperature photoluminescence (PL), we study the transformation of PL spectra for different proton doses and annealing temperatures. Among well reported defect signatures, we observe omnipresent but not yet identified PL signatures consisting of three sharp and temperature stable lines (denoted TS1,2,3) at 768.8 nm, 812.0 nm, and 813.3 nm. These lines show a strong correlation throughout all measurement parameters, suggesting that they belong to the same microscopic defect. Further, a clear dependence of the TS1,2,3 line intensities on the initial implantation dose is observed after annealing, indicating that the underlying defect is related to implantation induced intrinsic defects. The overall data suggest a sequential defect transformation: proton irradiation initially generates isolated silicon vacancies which are transformed into antisite vacancy complexes which are, in turn, transformed into presumably intrinsic-related defects, showing up as TS1,2,3 PL lines. We present recipes for the controlled generation of these color centers.

We present a photoluminescence (PL) study of the recently discovered TS defect in 4H silicon carbide. It investigates the influence of static electric fields and local strain on the spectral properties by means of low temperature (≈4 K) ensemble measurements. Upon application of static electric fields exerted by graphene electrodes, line splitting patterns are observed, which are investigated for four different angles of the electric field with respect to the principal crystallographic axes. More detailed information can be gained when additionally the excitation polarization angle is systematically varied. Altogether, the data allow for extracting the direction of the associated electric dipole moments, revealing three distinct orientations of the underlying TS defect inside the crystal’s basal plane. We also present three so far unreported PL lines (836.7 nm, 889.7 nm, 950.0 nm) as candidates for out-of-plane oriented counterparts of the TS lines. Similar to symmetry breaking by the electric field applied, strain can reduce the local symmetry. We investigate strain-induced line splitting patterns that also yield a threefold directedness of the TS lines in accordance with the Stark effect measurements. The response to both electrical and strain fields is remarkably strong, leading to line shifts of ±12 meV of the TS1 line. Combining our findings, we can narrow down possible geometries of the TS defect.

Germanium (Ge) doping of 4H silicon carbide (SiC) has recently attracted attention because a conductivity-enhancing effect was reported. In this work, we report on an experimental and theoretical approach to elucidate this effect. Ge and tin (Sn) – a second candidate of group IV elements – have been implanted into n-type 4H-SiC. Despite the expected isoelectric nature of Ge and Sn, a more efficient annealing of implantation-induced defects was observed compared to noble gas implantation with identical simulated initial implantation damage. In particular, a strong reduction of the prominent Z1/2 defect was observed. Density functional theory calculations under equilibrium conditions show that Ge is mainly incorporated on a substitutional silicon lattice site without creating new charge transition levels in the bandgap. The low abundance of other Ge-related defects suggests that kinetic mechanisms should be responsible for the observed effect of group IV doping.