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Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO 2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO 2 with rutile structure.

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The aim of the present paper has been to verify the effectiveness and usefulness of a novel deposition process named GIMS (Gas Injection Magnetron Sputtering) used for the first time for deposition of Ti/TiO 2 coatings on large area glass substrates covered in the condition of industrial scale production. The Ti/TiO 2 coatings were deposited in an industrial system utilizing a set of linear magnetrons with the length of 2400 mm each for covering the 2000 × 3000 mm glasses. Taking into account the specific course of the GIMS (multipoint gas injection along the magnetron length) and the scale of the industrial facility, the optical coating uniformity was the most important goal to check. The experiments on Ti/TiO 2 coatings deposited by the use of GIMS were conducted on substrates in the form of glass plates located at the key points along the magnetrons and intentionally non-heated during any stage of the process. Measurements of the coatings properties showed that the thickness and optical uniformity of the 150 nm thick coatings deposited by GIMS in the industrial facility (the thickness differences on the large plates with 2000 mm width did not exceed 20 nm) is fully acceptable form the point of view of expected applications e.g. for architectural glazing.