The artificial creation of shallow nitrogen‐vacancy (NV) centres in diamond with 25 nm lateral resolution is performed by collimated implantation of low‐energy nitrogen ions. The electron spin associated to this defect is the most promising qubit for a scalable quantum computer working at room temperature. Individual optical addressing of two single centres separated by only 16 nm is demonstrated with stimulated emission depletion (STED) microscopy.

We have investigated the merits of fullerene cluster ions as projectiles in time-of-flight secondary neutral mass spectrometry (ToF-SNMS) sputter depth profiling of an Ni : Cr multilayer sample similar to the corresponding NIST depth profiling standard. It is shown that sputter erosion under bombardment with C 60 + ions of kinetic energies between 10 and 20 keV provides good depth resolution corresponding to interface widths of several nanometres. This depth resolution is maintained during the complete removal of the multilayer stack with a total thickness of 500 nm. This finding is in contrast to the case where atomic Ga + projectile ions of comparable kinetic energy are used, demonstrating the unique features of cluster projectiles in sputter depth profiling.

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Nano device prototyping (NDP) is essential for realizing and assessing ideas as well as theories in the form of nano devices, before they can be made available in or as commercial products. In this review, application results patterned similarly to those in the semiconductor industry (for cell phone, computer processors, or memory) will be presented. For NDP, some requirements are different: thus, other technologies are employed. Currently, in NDP, for many applications direct write Gaussian vector scan electron beam lithography (EBL) is used to define the required features in organic resists on this scale. We will take a look at many application results carried out by EBL, self-organized 3D epitaxy, atomic probe microscopy (scanning tunneling microscope/atomic force microscope), and in more detail ion beam techniques. For ion beam techniques, there is a special focus on those based upon liquid metal (alloy) ion sources, as recent developments have significantly increased their applicability for NDP.

In this article, the authors review, compare, and discuss the characteristics and applicative potential of a variety of nongallium ion liquid metal ion sources they have developed and successfully applied to nanopatterning. These sources allow generating on-demand ion beams and are promising for extending focused ion beams applications. They detail the operating characteristics of such sources capable to emit metal projectiles ranging from atomic ions with different charge states to polyatomic ions and to large metal clusters having sizes up to a few nanometers. They highlight their interest and relevance to current nanoscience challenges in terms of ultimate patterning or bottom-up nanofabrication capabilities.