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In present paper the utilization of the two types of inorganic resists: Ag-chalcogenide glass (ChG) structures and thin ChG layers for holograms recording is discussed. The optical characteristics and photographic properties of this materials were investigated, the study of hologram relief formation in ChGAg and ChG layers have been made. Among the investigated ChG layers the As40S20Se40 have shown the most optimal characteristics for the hologram recording. Good mechanical strength and thermostability of ChG layers enabled to use the obtained phase relief holograms after additional treatment for the production of thermo-or photopolymer copies, or galvanic nickel deposition. The high quality polymer copies and nickel matrixes for mass production were obtained from the chalcogenide based master holograms. characteristics of the obtained phase-relief holograms and their copies were investigated.