We present an optical interference system nanoprofiler MNP-1 designed for high-precision noncontact measurement of surface relief with subnanometer resolution (root mean square of measured values), based on partial scanning of interference signal. The paper describes the construction of the measurement system with Linnik interferometer and the algorithm for nanorelief surface reconstruction. Experimental measurement results of silicon sample with profile height of surface structure of one interatomic distance obtained by MNP-1 are shown. It was proposed to use an atomically smooth surface as the reference mirror in the interferometer MNP-1 that allowed us to measure monatomic steps of the presented silicon sample. Monatomic steps of 0.31 nm in height on silicon (111) surface were measured with resolution up to 5 pm.
In scanning interferometry of longitudinal shift, an uncertainty of required phase shift performance leads to a measurement error. Such uncertainty can be caused by external factors (vibrations, air turbulence in measuring area etc.) as well as inaccuracy of the scanning system. The method for calculating the phase shift between interferograms, which allows reducing the measurement error, is proposed. The results of numerical and full scale experiments are presented.
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