We report on the growth, fabrication, and device characterization of NbN internally shunted Josephson junctions with a TaNx barrier. The resistivity of TaNx films could be varied from a few hundred micro-ohms to a few hundred milliohms by increasing the N2 pressure during reactive sputtering. The temperature dependence of IcRn of the junctions with ∼13 mΩ cm barrier resistivity was measured for various barrier thicknesses. The coherence length of the barrier was determined to be 5 nm. By adjusting the barrier thickness, IcRn values >500 μV were observed up to 8.3 K, with Ic and Rn of magnitudes that are suitable for single-flux-quantum digital circuits.

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A~~t~a~~ ---A novel asynchronous timing scheme, ata-driven self-timing (DDST) is proposed and imple--Flux-Quantum (RSFQ) superircuits. In this asynchronous als are generated from the data ded to drive the RSFQ circuit the self-timing scheme is to g in order to avoid the overhead ion, and to minimize the timing scheme has been applied to the register, a demultiplexor, and a selfst system. In this paper, test register and a high speed onerator will be presented to demonstrate the ST operation of RSFQ integrated circuits at a rate of 20 Gbk.

Characterization and modeling of CMOS devices at 4.2 K are carried out in order to simulate low-temperature operation of CMOS circuits for Josephson-CMOS hybrid systems. CMOS devices examined in this study have been fabricated by using 0.18 m, 0.25 m, and 0.35 m commercial CMOS processes. Their static I-V characteristics and capacitances are measured at 4.2 K to establish the low-temperature device model based on the BSIM3 SPICE model. The propagation delays of CMOS inverters measured by using ring oscillators agree well with the simulation results. The experimental results indicate about 40% speedup from 300 K to 4.2 K. A three-transistor DRAM cell for a Josephson-CMOS hybrid memory is also investigated at low temperature. The temperature dependence of the retention time shows an exponential increase at low temperatures. Based on the lowtemperature CMOS device model, we have developed short-delay CMOS amplifiers, which would amplify a 40 mV voltage input to CMOS voltage level with the propagation delay of about 100 ps, assuming the use of a 0.18 m CMOS process. We have measured the propagation delay of the CMOS amplifier by using a single-flux-quantum (SFQ) delay measurement system. This is a complete demonstration of the signal exchanges between SFQ and CMOS circuits at 4.2 K.