A series of high silicon zeolites Y were prepared through direct synthetic method by using silica sol as the silicon source and sodium aluminate as the aluminum source. The effects of alkalinity and crystallization time of the process of synthesis were investigated. To separately reveal the crystalline structure, element content, morphology, and surface areas, the as-synthesized zeolite Y was characterized by powder X-ray diffraction (XRD), X-ray fluorescence (XRF), scanning electron microscopy (SEM), and N2adsorption-desorption isotherms (BET). The results show the as-synthesized zeolite Y with high relative crystallization and uniform morphology; the SiO2/Al2O3ratio was about 4.54~6.46. For an application, the zeolite cracking activity was studied with cumene as the probe molecules.
We developed a simple approach to fabricate graphene/Si heterojunction solar cells via direct growth of graphene nanowalls on Si substrate. This 3D graphene structure was outstanding electrode network and could form fine interface with Si substrate. Moreover, direct growth method not only simplified manufacturing process, but also avoided damages and contaminants from graphene transfer process. The short-circuit current (Jsc) increased greatly and could reach 31 mA/cm2. After HNO3 doping, the energy conversion efficiency was increased up to 5.1%. Furthermore, we investigated the influence of growth time on the cell performance.
Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.
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