We fabricated a novel lateral-current-injection-type distributed feedback (DFB) laser with amorphous-Si (a-Si) surface grating as a step to realize membrane lasers. This laser consists of a thin GaInAsP core layer grown on a semi-insulating InP substrate and a 30-nm-thick a-Si surface layer for DFB grating. Under a room-temperature continuous-wave condition, a low threshold current of 7.0 mA and high efficiency of 43% from the front facet were obtained for a 2.0-μm stripe width and 300-μm cavity length. A small-signal modulation bandwidth of 4.8 GHz was obtained at a bias current of 30 mA.
A current-injection-type semiconductor membrane distributed feedback laser consisting of a 470-nm-thick semiconductor core and bonded by a benzocyclobutene polymer on a silicon-on-insulator substrate was demonstrated for the first time by adopting a lateral current-injection structure. Room-temperature pulsed operation was achieved with a threshold current of 83 mA for a stripe width of 3.2 µm and cavity length of 420 µm.
Toward the light source for on-chip interconnection, a current-injection-type membrane distributed feedback laser with a surface gating structure is demonstrated. In this device, 450-nm-thick GaInAsP/InP layers with lateral-current-injection structure prepared by a two step OMVPE regrowth-method is bonded on a host substrate by using Benzocyclobutene bonding process. A threshold current of I th =11 mA is obtained with a cavity length of 300 µm and a stripe of 1 µm.
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