100 nm period grating by high-index phase-mask immersion lithography

Bourgin, Yannick; Jourlin, Yves; Parriaux, Ο.; Talneau, A.; Tonchev, S.; Veillas, Colette; Karvinen, Petri; Passilly, Nicolas; Zain, Ahmad Rifqi Md; Rue, R.M. De La; Erps, Jürgen Van; Tománek, David

doi:10.1364/oe.18.010557

Cited by 23 publications

(11 citation statements)

References 17 publications

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“…Bourgin et al tried to demonstrate this idea by creating a 0th-order-free grating with a 200 nm-period to form resist patterns pitched at 100 nm [8]. Although the obtained patterns had a single period of 100 nm, they were only ∼10 nm in depth because of unstable laser oscillations and fringe movements during exposure, as mentioned by the authors.…”

Section: B Exposure Experiments and Resultsmentioning

confidence: 99%

“…Realizing SWSs for visible light requires patterning with a sub-200 nm period. For the simple line and dot patterns of the SWSs, which are useful in many applications, interference lithography [4][5][6][7][8] is one of the few promising manufacturing methods. By using interference exposure with a deep-ultraviolet (DUV) laser, sub-100 nm line widths can be resolved across a working area measuring several inches in diameter.…”

Section: Introductionmentioning

confidence: 99%

“…Fringe locking technology in a two-beam interference, which prevents fringes from moving, is suitable for mass production [4]. Similarly, employing a grating mask to create fringes causes the exposure configuration to be less susceptible to disturbances which can lower the fringe visibility [7,8].…”

Section: Introductionmentioning

confidence: 99%

“…The two important configurations used for gratings are the Bragg-angle incidence [7] and normal incidence [8]. The former has an advantage over the latter in that only two beams are created to attain a high fringe visibility.…”

Section: Introductionmentioning

confidence: 99%

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Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Amako

Sawaki

2012

Appl. Opt.

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Interference lithography using a deep-ultraviolet (DUV) laser is instrumental in the manufacture of subwavelength patterns used at visible wavelengths. We investigated a grating mask strategy for exposure in terms of how to set and illuminate masks. To obtain high aspect ratio patterns, high fringe visibility, and high exposure uniformity are essential, and for that purpose the use of only two beams with liquid immersion is necessary but not sufficient. It needs to be addressed whether the grating should face air or liquid to achieve index matching without affecting its beam-splitting properties. Currently, the most feasible solution to produce sub-200 nm periods requires the use of a fused-silica grating under Bragg geometry (not normal incidence geometry) and filling the gap between the grating and resist with a high-index liquid.

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Section: B Exposure Experiments and Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Amako

Sawaki

2012

Appl. Opt.

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“…Near-field holography (NFH) at either normal [15,16] or Littrow [17] incidence has a strong potential as a method to realize soft x-ray gratings. Compared to conventional holographic lithography, with its complex experimental setups [7] , in this method only a fused silica phase mask as a beam splitter is necessary to generate grating patterns.…”

mentioning

confidence: 99%

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Chen

Kroker

et al. 2016

中国光学快报

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Near-field holography (NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization of soft x-ray diffraction gratings. We show that NFH with reflections reduced by the integration of antireflective coatings (ARCs) simplifies the NFH process relative to that of setups using refractive index liquids. Based on the proposed NFH with ARCs, gold-coated laminar gratings were fabricated using NFH and subsequent ion beam etching. The efficiency angular spectrum shows that the stray light of the gratings is reduced one level of magnitude by the suppression of interface reflections during NFH.

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Conformable Solid‐Index Phase Masks Composed of High‐Aspect‐Ratio Micropillar Arrays and Their Application to 3D Nanopatterning

Park

Kim

et al. 2011

Advanced Materials

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Three-dimensional (3D) microstructures are essential elements in various technological applications, including optical coatings, [ 1 , 2 ] tissue engineering scaffolds, [ 3 ] microfl uidics, [ 4 ] energy storage devices, [ 5 , 6 ] plasmonics, [ 7 ] and photonic crystals. [ 8 , 9 ] While conventional methods, such as photo lithography and electron beam lithography, are costly and ineffective in the generation of complex 3D patterns over large areas, unconventional methods based on soft lithography, such as nanoimprint lithography (NIL), [ 10 ] nanotransfer printing (nTP), [ 11 ] microcontact printing ( μ CP), [ 12 ] and micromolding in capillaries (MIMIC), [ 13 ] provide simple and inexpensive routes to fabricate complex multidimensional nanostructures. Above all, proximity fi eld nanopatterning (PnP), [ 14 ] which uses elastomeric components similar to those used in soft lithography, can generate complex 3D nanostructures very rapidly over large areas. Optical interference from the conformable elastomers, working as phase shift elements, generates a complex 3D intensity distribution by the Talbot effect, [ 15 ] or self-imaging effect. The diffracted images of surface relief structures are periodically repeated at integer or fractional Talbot distances from the surface of the mask.Pattern resolution in soft lithography is mainly determined by the fi neness and the aspect ratio of elastomeric surface relief structures, which generally consist of poly(dimethylsiloxane) (PDMS), from a Si master that contains the desired relief patterns on its surface. The height of the relief structures is particularly important in PnP because it defi nes the magnitude of the phase shift as a function of the refractive index and the wavelength of the incident light. [ 16 ] Hence, relief structures with a high aspect ratio and narrow spacings ( < 1 μ m) between features must be well-controlled (i.e., straightness, duty cycle). Currently, two critical issues complicate control of these requirements. The fi rst issue is the limited thickness and physical damage of a patterned photoresist on a Si wafer that serves as a master; a thicker resist can lead to greater diffi culty and a higher potential for damage during the photopatterning and replication processes. The second issue is the low Young's modulus of soft elastomers ( ≈ 2-9 MPa), [ 17 ] which causes a collapse or a break in the neck of elastomeric relief structures, even after fi ne replication from the master. The low mechanical property also results in problems such as surface wrinkling, [ 18 ] sagging, buckling, and deforming [ 19 , 20 ] of the elastomers. Thus, reproducibility of the patterning cannot be guaranteed when using conformal contact-dependent methods. Several mold materials, such as polyolefi n, [ 21 ] modifi ed polyurethane, [ 22 ] PDMS, [ 23 , 24 ] and perfl uoropolyether (PFPE), [ 25 ] have been proposed to increase the Young's modulus and aspect ratio of the relief structures. Nevertheless, dense and fi ne relief structures with a high aspect ratio compose...

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100 nm period grating by high-index phase-mask immersion lithography

Cited by 23 publications

References 17 publications

Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Conformable Solid‐Index Phase Masks Composed of High‐Aspect‐Ratio Micropillar Arrays and Their Application to 3D Nanopatterning

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