2012
DOI: 10.1109/tcsi.2011.2167264
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An SRAM Reliability Test Macro for Fully Automated Statistical Measurements of ${\rm V} _{\rm MIN}$ Degradation

Abstract: Negative bias temperature instability (NBTI) has been considered as a main reliability issue in SRAMs since the threshold voltage degradation of PMOS transistors due to NBTI has raised minimum operating voltage (V MIN ) over time. This paper explains an SRAM reliability test macro designed in a 1.2 V, 65 nm CMOS process technology for statistical measurements of V MIN degradation coming from NBTI. An automated test program efficiently collects statistical V MIN data and reduces test time. The proposed test str… Show more

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Cited by 12 publications
(6 citation statements)
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“…On the other hand, to keep the memory functioning and maintain the data at hold mode, memory designers usually consider performing some tests during the memory lifetime and increase the standby supply voltage [19]. Increasing the supply voltage step by step improves the hold SNMs and keeps the memory functional at lower voltages than active supply voltage.…”
Section: Adaptive Proactive Approach In Presence Of Dual Vddmentioning
confidence: 99%
“…On the other hand, to keep the memory functioning and maintain the data at hold mode, memory designers usually consider performing some tests during the memory lifetime and increase the standby supply voltage [19]. Increasing the supply voltage step by step improves the hold SNMs and keeps the memory functional at lower voltages than active supply voltage.…”
Section: Adaptive Proactive Approach In Presence Of Dual Vddmentioning
confidence: 99%
“…As the SNM becomes more negative, the speed of the data-flip becomes higher [6]. This is because the more negative SNM provides larger voltage disturbance into the cell nodes and the positive feedback of the cross-coupled inverters amplifies it faster.…”
Section: Data-flip Time Dependency On Nbti/pbtimentioning
confidence: 99%
“…A number of works have dealt with the impact of NBTI and PBTI on SRAM operation [3][4][5][6]. The threshold voltage degradation due to NBTI and PBTI decreases cell stability, which will become even more serious when combined with device mismatches [5,6].…”
Section: Introductionmentioning
confidence: 99%
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“…When stress is removed, it starts the recovery phase wherein the trapped holes are released and the diffused Hydrogen atoms, diffuse back to the Si-interface [ Fig. 1(b)] [1]. Due to hole de-trapping in the gate-oxide [2], upon removal of the negative stress there is an immediate partial recovery from the threshold shift that occurred during stress.…”
Section: Introductionmentioning
confidence: 99%