Assembly of an aperture plate system for projection mask-less lithography

Mohaupt, Matthias; Eberhardt, Ramona; Damm, Christoph; Peschel, Thomas; Tünnermann, Andreas; Haugeneder, E.; Döring, Hans-Joachim; Brandstätter, C.

doi:10.1016/j.mee.2006.01.069

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Typical Mems Challenges For Maskless1

Maskless Approaches1

Introduction1

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2006

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Cited by 4 publications

(3 citation statements)

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“…Special assembly equipment to align within about 200 nm is necessary [31]. Combining MEMS parts with CMOS electronics poses its own challenges: the CMOS must be produced first because foundries can only work on virgin wafers.…”

Section: Typical Mems Challenges For Masklessmentioning

confidence: 99%

The role of MEMS in maskless lithography

Kruit

2007

Microelectronic Engineering

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Section: Typical Mems Challenges For Masklessmentioning

confidence: 99%

The role of MEMS in maskless lithography

Kruit

2007

Microelectronic Engineering

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“…Mapper develops a low energy electron optic column (5 kV), Leica develops a high energy electron optic column (100 kV) [3,4]. The projects are at the end of the first phase and it is expected that a proof of concept will be demonstrated by the end of 2005.…”

Section: Maskless Approachesmentioning

confidence: 99%

Status and future of maskless lithography

Henry¹,

Gemmink²,

Pain³

et al. 2006

Microelectronic Engineering

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“…Kruit 14) utilized a special assembly equipment. 15) The resulting misalignment was within about 200 nm. The misalignment can lead to change of micro-column performance 7,8,13) such as additional aberration and increase of minimum beam spot size.…”

Section: Introductionmentioning

confidence: 95%

Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography

Chen

et al. 2010

Jpn. J. Appl. Phys.

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We study soft-gluon radiation in top quark decay within the framework of perturbative fragmentation functions. We present results for the b-quark energy distribution, accounting for soft-gluon resummation to next-to-leading logarithmic accuracy in both the MS coefficient function and in the initial condition of the perturbative fragmentation function. The results show a remarkable improvement and the b-quark energy spectrum in top quark decay exhibits very little dependence on factorization and renormalization scales. We present some hadron-level results in both x B and moment space by including non-perturbative information determined from e + e − data.

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Assembly of an aperture plate system for projection mask-less lithography

Cited by 4 publications

References 0 publications

The role of MEMS in maskless lithography

The role of MEMS in maskless lithography

Status and future of maskless lithography

Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography

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